Effect of residual lithium compounds on layer Ni-Rich Li[Ni 0.7Mn0.3]O2

Journal of the Electrochemical Society

Volumn 161, Issue 6, 2014, Pages

  Cho, Dae Hyun ^a   Jo, Chang Heum ^a   Cho, Woosuk ^b   Kim, Young Jun ^b   Yashiro, Hitoshi ^c   Sun, Yang Kook ^d   Myung, Seung Taek ^a  

^a Sejong University   (South Korea)

^b Korea Electronic Technology Institute (KETI)   (South Korea)

^c IWATE UNIVERSITY   (Japan)

^d Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BYPRODUCTS; COATED MATERIALS; LITHIUM ALLOYS; LITHIUM COMPOUNDS; MANGANESE; NICKEL; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ACTIVE MATERIAL; CATHODE PERFORMANCE; ELECTROCHEMICAL REACTIONS; ELECTROCHEMICAL TEST; INSULATING LAYERS; IRREVERSIBLE CAPACITY; LITHIUM OXIDES; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY;

LITHIUM;

EID: 84904797995     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.042406jes     Document Type: Article

References (22)

1. J. Xiao, N. A. Chernova, and M. S. Whittingham, Chem. Mater., 22, 1180 (2010).
2. Y.-K. Sun, Z. H. Chen,H.-J. Noh,D.-J. Lee, H.-G. Jung,Y. Ren, S. Wang, C.-S.Yoon, S.-T. Myung, and K. Amine, Nat. Mater., 11, 942 (2012).
3. M. Guilmard, L. Croguennec, and C. Delmas, J. Electrochem. Soc., 150, A1287 (2003).
4. J. R. Dahn, U. Vonsacken, M. W. Juzkow, and H. Aljanaby, J. Electrochem. Soc., 138, 2207 (1991).
5. R. Kosteki and F. McLarnon, Electrochem. Solid-State let., 7, A380 (2004).
6. T. Ohzuku and A. Ueda, Solid State Ionics, 69, 201 (1994).
7. M. E. Spahr, P. Novak, B. Schnyder, O. Haas, and R. Nesper, J. Electrochem. Soc., 145, 1113 (1998).
8. D. P. Abraham, R. D. Twesten, M. Balasubramanian, I. Petrov, J. McBreen, and K. Amine, Electrochem. Commun., 4, 620 (2002).
9. C. Pouillerie, L. Croguennec, Ph. Biensan, P. Willmann, and C. Delmas, J. Electrochem. Soc., 147, 2061 (2000).
10. G. Dutta, A. Manthiram, J. B. Goodenough, and J.-C. Grenier, J. Solid State Chem., 96, 123 (1992).
11. H. Arai, S. Okada, H. Ohtsuka, M. Ichimura, and J. Yamaki, Solid State Ionics, 80, 261 (1995).
12. S.-T. Myung, A. Ogata, K.-S. Lee, S. Komaba, Y.-K. Sun, and H. Yashiro, J. Electrochem. Soc., 155, A374 (2008).
13. D.-H. Cho, H. Yashiro, Y.-K. Sun, and S.-T.Myung, J. Electrochem. Soc., 161, A142 (2014).
14. M. Hirayana, H. Ido, K. Kim, W. Cho, K. Tamura, J. Mizuki, and R. Kanno, J. Am. Chem. Soc., 132, 12568 (2010).
15. R. Shannon, Acta. Cryst. A, 32, 751 (1976).
16. Y.-K. Sun, D.-J. Lee, Y. J. Lee, Z. Chen, and S.-T. Myung, ACS Appl. Mater. Interfaces, 5, 11434 (2013).
17. T. Ohzuku, A. Ueda, and M. Nagayama, J. Elecrochem. Soc., 7, 1862 (1993).
18. W. Li, J. N. Reimers, and J. R. Dahn, Solid State Ionics, 67, 123 (1993).
19. S.-T. Myung, K. Izumi, S. Komaba, Y.-K. Sun, H. Yashiro, and N. Kumagai, Chem. Mater., 17, 3695 (2005).
20. M. Moshkovich, M. Cojocaru, H. E. Gottlieb, and D. Aurbach, J. Electroanal. Chem., 497, 84 (2001).
21. D. Aurbach, J. Electrochem. Soc., 136, 906 (1989).
22. K. Edström, T. Gustafsson, and J. O. Thomas, Electrochim. Acta, 50, 379 (2004).