Removal performance and the underlying mechanisms of plasma-induced CD/MWCNT/iron oxides towards Ni(II)

Chemical Engineering Journal

Volumn 256, Issue , 2014, Pages 128-136

  Dong, Ping ^a   Wu, Xilin ^b   Sun, Zhuyou ^c   Hu, Jun ^b   Yang, Shitong ^a  

^a SOOCHOW UNIVERSITY   (China)

^b INSTITUTE OF PLASMA PHYSICS   (China)

^c NANJING UNIVERSITY   (China)

Author keywords

Low temperature plasma; Magnetic CD MWCNT iron oxides; Ni(II); Simulated effluent; XAFS analysis

Indexed keywords

DISPERSIONS; IRON OXIDES; MAGNETOPLASMA; TEMPERATURE;

DISPERSION PROPERTIES; HIGH-SATURATION MAGNETIZATION; INNER SPHERE COMPLEXES; LOW TEMPERATURE PLASMAS; PHYSICO-CHEMICAL STABILITY; REGENERATION PROPERTIES; X RAY ABSORPTION FINE STRUCTURES; XAFS;

NICKEL;

EID: 84904498888     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2014.06.109     Document Type: Article

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