Peculiarities and mechanism of surface topography changes in photochromic cholesteric oligomer-based films

Colloid and Polymer Science

Volumn 292, Issue 7, 2014, Pages 1567-1575

  Sinitsyna, Olga ^a   Bobrovsky, Alexey ^a   Yaminsky, Igor ^a   Shibaev, Valery ^a  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

Atomic force microscopy; Cholesteric films; Helix pitch; Photochromic substances; Photoisomerization; Surface topography

Indexed keywords

ATOMIC FORCE MICROSCOPY; ISOMERS; MIXTURES; PHOTOCHROMISM; PHOTOISOMERIZATION; SEMICONDUCTOR DOPING; TOPOGRAPHY;

CHOLESTERIC FILM; HELICAL TWISTING POWER; HELIX PITCH; PHOTOCHROMIC SUBSTANCES; SURFACE FEATURE; THERMALLY INDUCED; TOPOGRAPHICAL CHANGES; WIDE SPECTRAL RANGE;

SURFACE TOPOGRAPHY;

OLIGOMER;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHIRALITY; COOLING; GEOMETRY; HANDEDNESS; ISOMERIZATION; PH; PRIORITY JOURNAL; QUANTITATIVE ANALYSIS; SURFACE PROPERTY; TEMPERATURE; TOPOGRAPHY; ULTRAVIOLET IRRADIATION; ULTRAVIOLET RADIATION;

EID: 84904329820     PISSN: 0303402X     EISSN: 14351536     Source Type: Journal    
DOI: 10.1007/s00396-014-3199-7     Document Type: Article

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