High-speed in-situ pulsed thermometry in oxide RRAMs

Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2014

Volumn , Issue , 2014, Pages

  Sharma, Abhishek A ^a   Noman, Mohammad ^a   Skowronski, Marek ^a   Bain, James A ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84904153824     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSI-TSA.2014.6839687     Document Type: Conference Paper

References (5)

1. L. Larcher et al., IEDM 2012, pp.20.1.1,20.1.4
2. Y. Y. Chen et al., IEDM 2012, pp.20.3.1,20.3.4
3. S. Yu, IEDM, 2012, vol., no., pp.26.1.1,26.1.4
4. E. Yalun et aL, IEEE EDL 33.1 (2012): 11-13
5. M. Noman et al, APL 102, 023507 (2013)