Plasmonic enhancement at metal atoms on graphene edges revealed by EFTEM

Journal of Physics: Conference Series

Volumn 522, Issue 1, 2014, Pages

  Pierce, W ^a   Zan, R ^a   Ramasse, Q M ^b   Boothroyd, C B ^c   Bangert, U ^a  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b DARESBURY LABORATORY   (United Kingdom)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; ELECTRIC LOSSES; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; PALLADIUM; PLASMONS;

CATALYSE; E-BEAMS; ELECTRIC FIELD ENHANCEMENT; ENERGY-FILTERED IMAGING; ETCHING PROCESS; GRAPHENE EDGES; LOW-LOSS; METAL ATOMS;

GRAPHENE;

EID: 84902973511     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/522/1/012078     Document Type: Conference Paper

References (6)

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2. Ramasse, Q M, Zan, R, Bangert, U, Boukhvalov, D W, Son, Y-W and Novoselov K S 2012 ACS Nano 6 (5) 4063
3. Zan, R; Bangert, U; Ramasse, Q; Novoselov, K S 2012 J. Phys. Chem. Lett. 3 (7) 953
4. Novoselov, K S; et al A 2004 Science 306 (5696) 666
5. Li, X; et al 2009 Science 5932 (324) 1312
6. Hardcastle T, Seabourne, C R, Zan, R, Brydson, R M D, Bangert, U, Ramasse, Q M Novoselov, K S and Scott, A J 2013 Phys. Rev. B 87 195430