Is silicene stable in O2? - First-principles study of O 2 dissociation and O2-dissociation-induced oxygen atoms adsorption on free-standing silicene

EPL

Volumn 106, Issue 4, 2014, Pages

  Liu, G ^a,c   Lei, X L ^a,c   Wu, M S ^a,c   Xu, B ^a,b   Ouyang, C Y ^a,c  

^a JIANGXI NORMAL UNIVERSITY   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^c Key Laboratory of Photoelectronics and Telecommunication of Jiangxi Province   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84901981473     PISSN: 02955075     EISSN: 12864854     Source Type: Journal    
DOI: 10.1209/0295-5075/106/47001     Document Type: Article

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