Electrochemical deposition of te and Se on Flat TiO2 for solar cell application

International Journal of Photoenergy

Volumn 2014, Issue , 2014, Pages

  Ito, Seigo ^a   Kitagawa, Noriyuki ^a   Shibahara, Takahiro ^a   Nishino, Hitoshi ^b  

^a UNIVERSITY OF HYOGO   (Japan)

^b OSAKA GAS CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMICAL DEPOSITION; GLASS; OPEN CIRCUIT VOLTAGE; REDUCTION; SOLAR CELLS;

AUGER-ELECTRON SPECTROSCOPY; BACK CONTACT; ELECTROCHEMICAL DEPOSITION; FILL-FACTOR; OPEN-CIRCUIT VOLTAGES; PHOTOCURRENT DENSITY; SOLAR-CELL APPLICATIONS; STACKED LAYER; SUPERSTRATES; TE DOPING;

TITANIUM DIOXIDE;

EID: 84901792844     PISSN: 1110662X     EISSN: 1687529X     Source Type: Journal    
DOI: 10.1155/2014/943538     Document Type: Article

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