Etching graphitic carbon nitride by acid for enhanced photocatalytic activity toward degradation of 4-nitrophenol

Chinese Chemical Letters

Volumn 25, Issue 9, 2014, Pages 1247-1251

  Wu, Si Zhan ^a   Chen, Cai Hong ^a   Zhang, Wei De ^a  

^a SOUTH CHINA UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

4 Nitrophenol; Etching; g C3N4; Photocatalyst

Indexed keywords

EID: 84901731331     PISSN: 10018417     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cclet.2014.05.017     Document Type: Article

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