Simultaneous removal of nitrate, hydrogen peroxide and phosphate in semiconductor acidic wastewater by zero-valent iron

Journal of Environmental Science and Health - Part A Toxic/Hazardous Substances and Environmental Engineering

Volumn 49, Issue 9, 2014, Pages 998-1006

  Yoshino, Hiroyuki ^a   Tokumura, Masahiro ^b   Kawase, Yoshinori ^a  

^a TOYO UNIVERSITY   (Japan)

^b YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

Hydrogen peroxide; Nitrate; Phosphate; Semiconductor acidic wastewater; Zero valent iron

Indexed keywords

CORROSION; FREE RADICALS; HYDROGEN PEROXIDE; IRON; METAL IONS; NITRATES; PEROXIDES; PHOSPHATES; WASTEWATER TREATMENT;

ACIDIC CONDITIONS; FENTON REACTIONS; FERROUS ION; POLLUTANT REMOVAL; REMOVAL RATE; SIMULTANEOUS REMOVAL; ZERO-VALENT IRON; ZEROVALENT IRONS;

NITROGEN REMOVAL;

FERRIC ION; FERROUS ION; HYDROGEN PEROXIDE; HYDROXYL RADICAL; IRON DERIVATIVE; NITRATE; PHOSPHATE; UNCLASSIFIED DRUG; ZERO VALENT IRON; INDUSTRIAL WASTE; IRON; NITRIC ACID DERIVATIVE; WASTE WATER; WATER POLLUTANT;

ACIDITY; ARTICLE; CORROSION; DEGRADATION; ELECTRON; EVALUATION STUDY; FEASIBILITY STUDY; FENTON REACTION; OXIDATION; PH; REDUCTION; SEMICONDUCTOR ACIDIC WASTEWATER; WASTE COMPONENT REMOVAL; WASTE WATER MANAGEMENT; WATER POLLUTANT; CHEMISTRY; INDUSTRIAL WASTE; PROCEDURES; SEMICONDUCTOR; SEWAGE; WASTE WATER;

HYDROGEN PEROXIDE; HYDROGEN-ION CONCENTRATION; INDUSTRIAL WASTE; IRON; NITRATES; PHOSPHATES; SEMICONDUCTORS; WASTE DISPOSAL, FLUID; WASTE WATER; WATER POLLUTANTS, CHEMICAL;

EID: 84900315602     PISSN: 10934529     EISSN: 15324117     Source Type: Journal    
DOI: 10.1080/10934529.2014.894841     Document Type: Article

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