Removal of Hg0 from containing-SO2/NO flue gas by ultraviolet/H2O2 process in a novel photochemical reactor

AIChE Journal

Volumn 60, Issue 6, 2014, Pages 2275-2285

  Liu, Yangxian ^a   Pan, Jianfeng ^a   Wang, Qian ^a  

^a JIANGSU UNIVERSITY   (China)

Author keywords

Flue gas; Photochemical spray reactor; Simultaneous removal

Indexed keywords

FLUE GASES; LIQUIDS;

INLET CONCENTRATION; NO CONCENTRATION; PHOTOCHEMICAL REACTOR; REMOVAL MECHANISM; SIMULTANEOUS REMOVAL; SOLUTION TEMPERATURE; SPRAY REACTOR;

SULFUR DIOXIDE;

EID: 84899964174     PISSN: 00011541     EISSN: 15475905     Source Type: Journal    
DOI: 10.1002/aic.14388     Document Type: Article

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