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Materials Science in Semiconductor Processing

Volumn 26, Issue 1, 2014, Pages 33-40

Structural, electrical and magnetoresistance of titanium-doped iron (II,III) oxide (Fe3O4) thin films deposited on strontium titanate, alumina, silicon, and Float Glass

(2) Varshney, Dinesh a Yogi, Arvind a,b

a DEVI AHILYA UNIVERSITY (India)

b INDIAN INSTITUTE OF SCIENCE EDUCATION AND RESEARCH (India)

Author keywords

Chemical synthesis; Electrical properties; Magnetic materials; X ray diffraction

Indexed keywords

ALUMINA; ALUMINUM; ELECTRIC PROPERTIES; GLASS; GLASS TRANSITION; MAGNETIC MATERIALS; MAGNETITE; MAGNETORESISTANCE; OXIDE FILMS; PULSED LASER DEPOSITION; SEMICONDUCTOR DOPING; SILICON; STRONTIUM TITANATES; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS; TITANIUM; X RAY DIFFRACTION;

CUBIC SPINEL STRUCTURE; DIFFERENT SUBSTRATES; FIELD DEPENDENCE; MAGNETIC FIELD DEPENDENCES; RAMAN ACTIVE MODES; ROOM TEMPERATURE; VARIOUS SUBSTRATES; VERWEY TRANSITIONS; FLOAT GLASS; IRON(II , III);

TITANIUM OXIDES; SYNTHESIS (CHEMICAL);

EID: 84899027664 PISSN: 13698001 EISSN: None Source Type: Journal
DOI: 10.1016/j.mssp.2014.04.002 Document Type: Article

Times cited : (8)

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