Wet chemical polishing for industrial type PERC solar cells

Energy Procedia

Volumn 38, Issue , 2013, Pages 243-249

  Kranz, Christopher ^a   Wyczanowski, Sabrina ^a   Baumann, Ulrike ^a   Weise, Katrin ^c   Klein, Cornelia ^c   Delahaye, Franck ^c   Dullweber, Thorsten ^a   Brendel, Rolf ^a,b  

^a INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

^b LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^c RENA GmbH   (Germany)

Author keywords

Cleaning sequences; PERC solar cells; Screen printing; Sheet resistance; Wet chemical polishing

Indexed keywords

EID: 84898712246     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2013.07.273     Document Type: Conference Paper

References (6)

1. SEMI PV Group 2012, International Technology Roadmap for Photovoltaic (ITRPV.net), Results 2011, http://www.itrpv.net/doc/roadmap-itrpv-2012-full-web. pdf, p. 13
2. th EUPVSEC, Hamburg, Germany; 2009, p. 1792
3. E. Cornagliotti, M. Ngamo, L. Tous, R. Russell, J. Horzel, D. Hendrickx et al., Integration of inline single-side wet emitter etch in PERC cell manufacturing, Energy Proceda 27; 2012, p. 624-660
4. th EU PVSEC, Hamburg; 2011, p. 2210
5. C. Kranz, S. Wyczanowski, S. Dorn, K. Weise, C. Klein, K. Bothe et al., Impact of the rear surface roughness on industrial-type PERC solar cells, Proc. 27th EUPVSEC, Frankfurt, Germany; 2012, p. 557-560
6. T. Dullweber et al., Towards 20% efficient large-area screen-printed rear-passivated silicon solar cells, Prog. Photovolt. 20(6); 2012, p. 630-638