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Macromolecular Chemistry and Physics

Volumn 215, Issue 7, 2014, Pages 614-623

Parameter study on the preparation of UV depth-cured chemically resistant polysulfone-based membranes

(4) Struzyńska Piron, Izabela a Loccufier, Johan b Vanmaele, Luc b Vankelecom, Ivo F J a

a UNIVERSITY OF LEUVEN (Belgium)

b AGFA GEVAERT N V (Belgium)

Author keywords

crosslinking; depth curing photoinitiators; membranes; polysulfone; UV curing

Indexed keywords

CROSSLINKING; CURING; PHOSPHORUS COMPOUNDS; POLYSULFONES;

LONG-TERM IMMERSIONS; MACROMOLECULAR STRUCTURES; PARAMETER STUDIES; PHOTO-INITIATOR; PHOTOINITIATING SYSTEMS; PHOTOINITIATORS; SOLVENT RESISTANCE; UV-CURING;

MEMBRANES;

EID: 84898032576 PISSN: 10221352 EISSN: 15213935 Source Type: Journal
DOI: 10.1002/macp.201300713 Document Type: Article

Times cited : (19)

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