Dynamic parameter estimation of atomic layer deposition kinetics applied to in situ quartz crystal microbalance diagnostics

Chemical Engineering Science

Volumn 111, Issue , 2014, Pages 15-33

  Holmqvist, A ^a   Torndahl T ^b   Magnusson, F ^a   Zimmermann, U ^b   Stenstrom S ^a  

^a LUND UNIVERSITY   (Sweden)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

Atomic layer deposition; Experimental model validation; In situ film characterization; Mathematical modeling; Optimization; Parameter identification

Indexed keywords

CONSERVATION; DEPOSITION; DYNAMIC MODELS; DYNAMICS; FILM GROWTH; IDENTIFICATION (CONTROL SYSTEMS); MATHEMATICAL MODELS; OPTIMIZATION; PARAMETER ESTIMATION; QUARTZ CRYSTAL MICROBALANCES; ZINC OXIDE;

CONSERVATION OF MASS; DYNAMIC PARAMETER ESTIMATIONS; EXPERIMENTAL MODELING; EXPERIMENTAL VALIDATIONS; FILM CHARACTERIZATIONS; PHYSICALLY BASED MODELING; SITU QUARTZ CRYSTAL MICROBALANCE; SURFACE CONCENTRATION;

ATOMIC LAYER DEPOSITION;

EID: 84897785414     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ces.2014.02.005     Document Type: Article

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