A-Si TFT technologies for AM-LCDS

Materials Research Society Symposium Proceedings

Volumn 336, Issue , 1994, Pages 749-756

  Ibaraki, Nobuki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CAPACITANCE; FIELD EFFECT TRANSISTORS; IONS;

APERTURE RATIO; CHANNEL REGION; DEVICE CHARACTERISTICS; FULLY SELF-ALIGNED; FUTURE TECHNOLOGIES; IMPLANTATION TECHNIQUE; PARASITIC CAPACITANCE; PICTURE QUALITY;

THIN FILM TRANSISTORS;

EID: 84897724854     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-336-749     Document Type: Conference Paper

References (0)