Improvement of film quality OF a-Si:H deposited by photo-CVD using SiH 2Cl2

Materials Research Society Symposium Proceedings

Volumn 336, Issue , 1994, Pages 91-96

  Oshima, T ^a   Yamaguchi, K ^a   Yamada, A ^a   Konagai, M ^a   Takahashi, K ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHLORINE COMPOUNDS; DETERIORATION; IMAGE ENHANCEMENT; METALLIC FILMS; OPTICAL PROPERTIES;

DEPOSITION SYSTEMS; ELECTRICAL , OPTICAL AND STRUCTURAL PROPERTIES; ELECTRICAL AND OPTICAL PROPERTIES; FILM PROPERTIES; FILM QUALITY; HYDROGENATED AMORPHOUS SILICON FILMS; LIGHT-INDUCED DEGRADATION; PHOTO-CVD;

SILICON COMPOUNDS;

EID: 84897584916     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-336-91     Document Type: Conference Paper

References (0)