Highly selective and sensitive determination of dopamine in the presence of ascorbic acid using a 3D graphene foam electrode

Electroanalysis

Volumn 26, Issue 1, 2014, Pages 184-190

  Huang, Shuo ^a   Yue, Hongyan ^b   Zhou, Jin ^a   Zhang, Jianjiao ^b   Zhang, Chunyu ^b   Gao, Xin ^b   Chang, Jing ^b  

^a THE FIRST AFFILIATED HOSPITAL OF HARBIN MEDICAL UNIVERSITY   (China)

^b HARBIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Ascorbic acid; Chemical vapor deposition; Dopamine; Graphene foam; Nickel foam

Indexed keywords

AMINES; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELECTROCHEMICAL ELECTRODES; GRAPHENE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; ITO GLASS; NEUROPHYSIOLOGY; NICKEL; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

3D GRAPHENE; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; CHEMICAL VAPOUR DEPOSITION; DOPAMINE; FOAM ELECTRODES; GRAPHENE FOAMS; MACROPOROUS; NICKEL FOAM; SYNTHESISED; X- RAY DIFFRACTIONS;

ASCORBIC ACID;

EID: 84897524050     PISSN: 10400397     EISSN: 15214109     Source Type: Journal    
DOI: 10.1002/elan.201300297     Document Type: Article

References (25)

1. Z. K Liu, J. H. Li, Z. H. Sun, G. A. Tai, S. P. Lau, F. Yan, ACS Nano 2012, 6, 810.
2. C. H. Xu, B. H. Xu, Y. Gu, Z. G. Xiong, J. Sun, X. S. Zhao, Energy Environ. Sci. 2013, 6, 1388.
3. Y. X Liu, X. C. Dong, P. Chen, Chem. Soc. Rev. 2012, 41, 2283.
4. Y. Wang, Y. Y. Shao, D. W. Matson, J. H. Li, Y. H. Lin, ACS Nano 2012, 4, 1790.
5. Y. R. Kim, S. Y. Bong, Y. J. Kang, Y. T. Yang, R. K. Mahajan, J. S. Kim, H. S. Kim, Biosens. Bioelectron. 2010, 25, 2366.
6. K. S. Novoselov, A. K. Geim, S. V. Morozov, D. Jiang, Y. Zhang, S. V. Dubonos, I. V. Grigorieva, A. A. Firsov, Science 2004, 306, 666.
7. V. Mani, A. P. Periasamy, S. M. Chen, Electrochem. Commun. 2012, 17, 75.
8. D. A. C. Brownson, M. Gómez-Mingot, C. E. Banks, Phys. Chem. Chem. Phys. 2011, 13, 20284.
9. Z. P. Chen, W. C. Ren, L. B. Gao, B. L. Liu, S. F. Pei, H. M. Cheng, Nature Mater. 2011, 10, 424.
10. P. Kalimuthu, S. A. John, Talanta 2010, 80, 1686.
11. T. V. Sathisha, B. E. K. Swamy, B. N. Chandrashekar, N. Thomas, B. Eswarappa, J. Electroanal. Chem. 2012, 674, 57.
12. D. Jia, J. Y. Dai, H. Y. Yuan, L. Lei, D. Xiao, Talanta 2011, 85, 2344.
13. I. D. O. Matos, W. A. Alves, ACS Appl. Mater. Interf. 2011, 3, 4437.
14. M. Noroozifar, M. Khorasani-Motlagh, R. Akbari, M. B. Parizi, Biosens. Bioelectron. 2011, 28, 56.
15. P. Wang, Y. X. Li, X. Huang, L. Wang, Talanta 2007, 73, 431.
16. S. J. Hong, L. Y. S. Lee, M. H. So, K. Y. Wong, Electroanalysis 2013, 25, 1.
17. S. Komathi, A. I. Gopalan, K. P. Lee, Analyst 2010, 135, 397.
18. Y. Yue, G. Z. Hu, M. B. Zheng, Y. Guo, J. M. Cao, S. J. Shao, Carbon 2012, 50, 107.
19. X. C. Dong, H. Xu, X. W. Wang, Y. X. Huang, M. B. Chan-Park, H. Zhang, L. H. Wang, W. Huang, P. Chen, ACS Nano, 2012, 24, 3206.
20. L. Wu, L. Y. Feng, J. S. Ren, X. G. Qu, Biosens. Bioelectron. 2012, 34, 57.
21. Y. Ding, Y. Wang, L. Su, M. Bellagamba, H. Zhang, Y. Lei, Biosens. Bioelectron. 2010, 26, 542.
22. C. L. Sun, H. H. Lee, J. M. Yang, C. C. Wu, Biosens. Bioelectron. 2011, 26, 3450.
23. K. J. Huang, Q. S. Jing, Z. W. Wu, L. Wang, C. Y. Wei, Colloid. Surf. B, Biointerf. 2011, 88, 310.
24. Y. B. Zeng, Y. Zhou, L. Kong, T. S. Zhou, G. Y. Shi, Biosens. Bioelectron. 2013, 45, 25.
25. Z. Guo, M. L. Seol, M. S. Kim, J. H. Ahn, Y. K. Choi, J. H. Liu, X. J. Huang, Analyst 2013, 138, 2683.