All-nanosheet ultrathin capacitors assembled layer-by-layer via solution-based processes

ACS Nano

Volumn 8, Issue 3, 2014, Pages 2658-2666

  Wang, Chengxiang ^a   Osada, Minoru ^a   Ebina, Yasuo ^a   Li, Bao Wen ^a   Akatsuka, Kosho ^a   Fukuda, Katsutoshi ^a,b   Sugimoto, Wataru ^b   Ma, Renzhi ^a   Sasaki, Takayoshi ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b SHINSHU UNIVERSITY   (Japan)

Author keywords

capacitance density; dielectric property; oxide nanosheets; solution based assembly processes; ultrathin capacitors

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; CALCIUM; CAPACITANCE; CAPACITORS; DIELECTRIC PROPERTIES; METAL INSULATOR BOUNDARIES; MULTILAYERS; NANOSHEETS; PHOTOLITHOGRAPHY; QUARTZ; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ASSEMBLY PROCESS; CAPACITANCE DENSITY; CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; LANGMUIR BLODGETT TECHNIQUES; METAL-INSULATOR-METAL STRUCTURES; OXIDE NANOSHEETS; ULTRA-THIN CAPACITORS; ULTRAVIOLET-VISIBLE ABSORPTION SPECTRUM;

RUTHENIUM;

EID: 84896950919     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn406367p     Document Type: Article

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