On heavy ion induced hard-errors in dielectric structures

IEEE Transactions on Nuclear Science

Volumn 34, Issue 6, 1987, Pages 1262-1268

  Wrobel, Theodore F ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84896095032     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/TNS.1987.4337463     Document Type: Article

References (6)

1. J. T. Blandford, A. E. Waskiewicz and J. C. Pickel, ”Cos-mic Ray Induced Permanent Damage in MNOS EAROMs,” IEEE Trans. Nucl. Sci., NS-31, No. 6, pp 1568–1560, December1984.
2. J. C. Pickel, J. T. Blandford, A. E. Waskiewicz and V. H. Strahan, “Heavy Ion Induced Permanent Damage in MOS Gate Insulators,” IEEE Trans. Nucl. Sci., NS-32, No.6, pp 4176–4179, December 1985.
3. R. L. Fleischer, P. B. Price and R. M. Walker, Nuclear Track in Solids, Principles and Applications, University of California Press, 1975.
4. E. J. Kobetich and R. Katz, “Energy Deposition by Electron Beams and Delta Rays,” Phys. Rev., 170, pp. 391–396, 396, 1968.
5. Handbook of Chemistry and Physics, Chemical Rubber Co., 1951.
6. A. M. Malvezzi and N. Bloembergen, “Time-Resolved Picosecond Optical Measurements of Laser-Excited Graphite,” Physical Review Letters, 57, No.1, pp 146–149, 1986.