메뉴 건너뛰기




Volumn 35, Issue 3, 2014, Pages 402-404

Benchmarking transition metal dichalcogenide MOSFET in the ultimate physical scaling limit

Author keywords

2D material; MOSFET; performance benchmarking; Scaling

Indexed keywords

ENERGY EFFICIENCY; MOSFET DEVICES; TRANSITION METALS;

EID: 84895930900     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2014.2300013     Document Type: Article
Times cited : (52)

References (20)
  • 3
    • 0036930466 scopus 로고    scopus 로고
    • Does source-to-drain tunneling limit the ultimate scaling of MOSFETs?
    • Dec.
    • J. Wang and M. Lundstrom, "Does source-to-drain tunneling limit the ultimate scaling of MOSFETs?" in Proc. IEEE IEDM, Dec. 2002, pp. 707-710.
    • (2002) Proc. IEEE IEDM , pp. 707-710
    • Wang, J.1    Lundstrom, M.2
  • 4
    • 84856986278 scopus 로고    scopus 로고
    • Ultimate device scaling: Intrinsic performance comparisons of carbon-based, InGaAs, and Si field-effect transistors for 5 nm gate length
    • Dec.
    • M. Luisier, M. Lundstrom, D. A. Antoniadis, and J. Bokor, "Ultimate device scaling: Intrinsic performance comparisons of carbon-based, InGaAs, and Si field-effect transistors for 5 nm gate length," in IEEE IEDM Tech. Dig., Dec. 2011, pp. 11.2.1-11.2.4.
    • (2011) IEEE IEDM Tech. Dig , pp. 1121-1124
    • Luisier, M.1    Lundstrom, M.2    Antoniadis, D.A.3    Bokor, J.4
  • 5
    • 84864755601 scopus 로고    scopus 로고
    • Material selection for minimizing direct tunneling in nanowire transistors
    • Aug.
    • S. S. Sylvia, H.-H. Park, M. A. Khayer, et al., "Material selection for minimizing direct tunneling in nanowire transistors," IEEE Trans. Electron Devices, vol. 59, no. 8, pp. 2064-2069, Aug. 2012.
    • (2012) IEEE Trans. Electron Devices , vol.59 , Issue.8 , pp. 2064-2069
    • Sylvia, S.S.1    Park, H.-H.2    Khayer, M.A.3
  • 6
    • 80052790285 scopus 로고    scopus 로고
    • How good can monolayer MoS2 transistors be
    • Jul.
    • Y. Yoon, K. Ganapathi, and S. Salahuddin, "How good can monolayer MoS2 transistors be?" Nano Lett., vol. 11, no. 9, pp. 3768-3773, Jul. 2011.
    • (2011) Nano Lett. , vol.11 , Issue.9 , pp. 3768-3773
    • Yoon, Y.1    Ganapathi, K.2    Salahuddin, S.3
  • 7
    • 80052090759 scopus 로고    scopus 로고
    • Performance limits of monolayer transition metal dichalcogenide transistors
    • Sep.
    • L. Liu, S. B. Kumar, Y. Ouyang, et al., "Performance limits of monolayer transition metal dichalcogenide transistors," IEEE Trans. Electron Devices, vol. 58, no. 9, pp. 3042-3047, Sep. 2011.
    • (2011) IEEE Trans. Electron Devices , vol.58 , Issue.9 , pp. 3042-3047
    • Liu, L.1    Kumar, S.B.2    Ouyang, Y.3
  • 8
    • 84870309390 scopus 로고    scopus 로고
    • Monolayer MoS2 transistors beyond the technology road map
    • Dec.
    • K. Alam and R. K. Lake, "Monolayer MoS2 transistors beyond the technology road map," IEEE Trans. Electron Devices, vol. 59, no. 12, pp. 3250-3254, Dec. 2012.
    • (2012) IEEE Trans. Electron Devices , vol.59 , Issue.12 , pp. 3250-3254
    • Alam, K.1    Lake, R.K.2
  • 9
    • 84889587365 scopus 로고    scopus 로고
    • On monolayer MoS2 field-effect transistors at the scaling limit
    • Dec.
    • L. Liu, Y. Lu, and J. Guo, "On monolayer MoS2 field-effect transistors at the scaling limit," IEEE Trans. Electron Devices, vol. 60, no. 12, pp. 4133-4139, Dec. 2013.
    • (2013) IEEE Trans. Electron Devices , vol.60 , Issue.12 , pp. 4133-4139
    • Liu, L.1    Lu, Y.2    Guo, J.3
  • 10
    • 84894339088 scopus 로고    scopus 로고
    • Dependence of intrinsic performance of transition metal dichalcogenide transistors on materials and number of layers at the 5 nm channel-length limit
    • Dec.
    • V. Mishra, S. Smith, K. Ganapathi, and S. Salahuddin, "Dependence of intrinsic performance of transition metal dichalcogenide transistors on materials and number of layers at the 5 nm channel-length limit," in IEEE IEDM Tech. Dig., Dec. 2013, pp. 136-139.
    • (2013) IEEE IEDM Tech. Dig , pp. 136-139
    • Mishra, V.1    Smith, S.2    Ganapathi, K.3    Salahuddin, S.4
  • 12
    • 84876100812 scopus 로고    scopus 로고
    • Uniform methodology for benchmarking beyond-CMOS logic devices
    • Dec.
    • D. E. Nikonov and I. A. Young, "Uniform methodology for benchmarking beyond-CMOS logic devices," in IEEE IEDM Tech. Dig., Dec. 2012, pp. 573-576.
    • (2012) IEEE IEDM Tech. Dig , pp. 573-576
    • Nikonov, D.E.1    Young, I.A.2
  • 13
    • 84866550114 scopus 로고    scopus 로고
    • Understanding the feasibility of scaled III-V TFET for logic by bridging atomistic simulations and experimental results
    • Jun.
    • U. E. Avci, S. Hasan, D. E. Nikonov, R. Rios, K. Kuhn, and I. A. Young, "Understanding the feasibility of scaled III-V TFET for logic by bridging atomistic simulations and experimental results," in IEEE Symp. VLSI Tech Dig., Jun. 2012, pp. 183-184.
    • (2012) IEEE Symp. VLSI Tech Dig , pp. 183-184
    • Avci, U.E.1    Hasan, S.2    Nikonov, D.E.3    Rios, R.4    Kuhn, K.5    Young, I.A.6
  • 14
    • 45149083048 scopus 로고    scopus 로고
    • Bandstructure effects in ultra-thin-body double-gate field effect transistor: A fullband analysis
    • Jun.
    • K. Majumdar and N. Bhat, "Bandstructure effects in ultra-thin-body double-gate field effect transistor: A fullband analysis," J. Appl. Phys., vol. 103, no. 11, pp. 114503-1-114503-9, Jun. 2008.
    • (2008) J. Appl. Phys. , vol.103 , Issue.11 , pp. 1145031-1145039
    • Majumdar, K.1    Bhat, N.2
  • 15
    • 46049090269 scopus 로고    scopus 로고
    • Armchair graphene nanoribbons: Electronic structure and electric-field modulation
    • Jun.
    • H. Raza and E. C. Kan, "Armchair graphene nanoribbons: Electronic structure and electric-field modulation," Phys. Rev. B, vol. 77, no. 24, pp. 245434-1-245434-5, Jun. 2008.
    • (2008) Phys. Rev. B , vol.77 , Issue.24 , pp. 2454341-2454345
    • Raza, H.1    Kan, E.C.2
  • 16
    • 84859577778 scopus 로고    scopus 로고
    • Large-area vapor-phase growth and characterization of MoS2 atomic layers on a SiO2 substrate
    • Apr.
    • Y. Zhan, Z. Liu, S. Najmaei, et al., "Large-area vapor-phase growth and characterization of MoS2 atomic layers on a SiO2 substrate," Small, vol. 8, no. 7, pp. 966-971, Apr. 2012.
    • (2012) Small , vol.8 , Issue.7 , pp. 966-971
    • Zhan, Y.1    Liu, Z.2    Najmaei, S.3
  • 17
    • 84860329324 scopus 로고    scopus 로고
    • Synthesis of large-area MoS2 atomic layers with chemical vapor deposition
    • May
    • Y.-H. Lee, X.-Q. Zhang, W. Zhang, et al., "Synthesis of large-area MoS2 atomic layers with chemical vapor deposition," Adv. Mater., vol. 24, no. 17, pp. 2320-2325, May 2012.
    • (2012) Adv. Mater. , vol.24 , Issue.17 , pp. 2320-2325
    • Lee, Y.-H.1    Zhang, X.-Q.2    Zhang, W.3
  • 18
    • 84868355107 scopus 로고    scopus 로고
    • Tunable dielectric response of transition metals dichalcogenides MX2 (M=Mo, W; X=S, Se, Te): Effect of quantum confinement
    • Dec.
    • A. Kumar and P. K. Ahluwalia, "Tunable dielectric response of transition metals dichalcogenides MX2 (M=Mo, W; X=S, Se, Te): Effect of quantum confinement," Phys. B, Condensed Matter, vol. 407, no. 24, pp. 4627-4634, Dec. 2012.
    • (2012) Phys. B, Condensed Matter , vol.407 , Issue.24 , pp. 4627-4634
    • Kumar, A.1    Ahluwalia, P.K.2
  • 20
    • 84859085243 scopus 로고    scopus 로고
    • Phonon-limited mobility in n-type single-layer MoS2 from first principles
    • Mar.
    • K. Kaasbjerg, K. S. Thygesen, and K. W. Jacobsen, "Phonon-limited mobility in n-type single-layer MoS2 from first principles," Phys. Rev. B, vol. 85, no. 11, pp. 115317-1-115317-16, Mar. 2012.
    • (2012) Phys. Rev. B , vol.85 , Issue.11 , pp. 1153171-11531716
    • Kaasbjerg, K.1    Thygesen, K.S.2    Jacobsen, K.W.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.