Controllable hybrid side-polishing method (CHPM) for optical fibers by combination of polishing and etching

Journal of Modern Optics

Volumn 60, Issue 20, 2013, Pages 1813-1820

  Esmaeilzadeh, Hamid ^a   Arzi, Ezatollah ^a   Légaré, François ^b   Hassani, Alireza ^b  

^a UNIVERSITY OF TEHRAN   (Iran)

^b INRS EMT   (Canada)

Author keywords

chemical etching; controllable hybrid polishing method (CHPM); evanescence field; optical fiber sensor; plasmonic sensor fabrication; side polishing

Indexed keywords

EID: 84893906171     PISSN: 09500340     EISSN: 13623044     Source Type: Journal    
DOI: 10.1080/09500340.2013.863401     Document Type: Article

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