-
1
-
-
33750423991
-
An industrial streamer corona plasma system for gas cleaning
-
DOI 10.1109/TPS.2006.881278
-
Winands G J J, Yan K, Pemen A J M, Nair S A, Liu Z and Van Heesch E J M 2006 IEEE Trans. Plasma Sci. 34 2426-33 (Pubitemid 44637636)
-
(2006)
IEEE Transactions on Plasma Science
, vol.34
, Issue.5
, pp. 2426-2433
-
-
Winands, G.J.J.1
Yan, K.2
Pemen, A.J.M.3
Nair, S.A.4
Liu, Z.5
Van Heesch, E.J.M.6
-
2
-
-
0039551298
-
-
10.1088/0963-0252/8/3/321 0963-0252 321
-
Pekárek S, Kriha V, Simek M, Bálek R and Hanitz F 1999 Plasma Sources Sci. Technol. 8 513-18
-
(1999)
Plasma Sources Sci. Technol.
, vol.8
, Issue.3
, pp. 513-518
-
-
Pekárek, S.1
Kriha, V.2
Simek, M.3
Bálek, R.4
Hanitz, F.5
-
8
-
-
77950286808
-
-
10.1002/ppap.200900097 1612-8850
-
Lloyd Gand Friedman G, Jafri S, Schultz G, Fridman A and Harding K 2010 Plasma Process. Polym. 7 194-211
-
(2010)
Plasma Process. Polym.
, vol.7
, pp. 194-211
-
-
Lloyd Gand Friedman, G.1
Jafri, S.2
Schultz, G.3
Fridman, A.4
Harding, K.5
-
12
-
-
84876235190
-
-
10.1088/0963-0252/22/2/025003 0963-0252 025003
-
Kettlitz M, Hoft H, Hoder T, Weltmann K D and Brandenburg R 2013 Plasma Sources Sci. Technol. 22 025003
-
(2013)
Plasma Sources Sci. Technol.
, vol.22
, Issue.2
-
-
Kettlitz, M.1
Hoft, H.2
Hoder, T.3
Weltmann, K.D.4
Brandenburg, R.5
-
16
-
-
70350630295
-
-
10.1088/0963-0252/18/4/045023 0963-0252 045023
-
Bruggeman P, Walsh J L, Schram D C, Leys C and Kong M G 2009 Plasma Sources Sci. Technol. 18 045023
-
(2009)
Plasma Sources Sci. Technol.
, vol.18
, Issue.4
-
-
Bruggeman, P.1
Walsh, J.L.2
Schram, D.C.3
Leys, C.4
Kong, M.G.5
-
20
-
-
84855902158
-
-
10.1088/0022-3727/45/4/045205 0022-3727 045205
-
Verreycken T, van der Horst R M, Baede A H F M, van Veldhuizen E M and Bruggeman P J 2012 J. Phys. D: Appl. Phys. 45 045205
-
(2012)
J. Phys. D: Appl. Phys.
, vol.45
, Issue.4
-
-
Verreycken, T.1
Van Der Horst, R.M.2
Baede, A.H.F.M.3
Van Veldhuizen, E.M.4
Bruggeman, P.J.5
-
21
-
-
84885406490
-
-
10.1088/0963-0252/22/5/055014 0963-0252 055014
-
Verreycken T, Mensink R, van der Horst R, Sadeghi N and Bruggeman P J 2013 Plasma Sources Sci. Technol. 22 055014
-
(2013)
Plasma Sources Sci. Technol.
, vol.22
, Issue.5
-
-
Verreycken, T.1
Mensink, R.2
Van Der Horst, R.3
Sadeghi, N.4
Bruggeman, P.J.5
-
28
-
-
17444430410
-
Pressure broadening parameters of the hydroxyl radical A 2 (μ′ = 0) ← X 2 Π3/2 (μ″ = 0) transitions at ca. 308 nm
-
DOI 10.1140/epjd/e2005-00022-0
-
Kasyutich V L 2005 Eur. Phys. J. D 33 29-33 (Pubitemid 40550486)
-
(2005)
European Physical Journal D
, vol.33
, Issue.1
, pp. 29-33
-
-
Kasyutich, V.L.1
-
30
-
-
65649099457
-
-
Standard Reference Database 17, version 7.0 (web version), Release 1.6.1 Data Version 2011.06
-
Manion J A 2011 NIST Chemical Kinetics Database, Standard Reference Database 17, version 7.0 (web version), Release 1.6.1 Data Version 2011.06
-
(2011)
NIST Chemical Kinetics Database
-
-
Manion, J.A.1
-
32
-
-
0342829278
-
-
10.1063/1.1731735
-
Young R A 1961 J. Chem. Phys. 34 1295-301
-
(1961)
J. Chem. Phys.
, vol.34
, pp. 1295-1301
-
-
Young, R.A.1
-
33
-
-
77952866374
-
-
10.1088/0022-3727/43/21/215202 0022-3727 215202
-
Akishev Y, Grushin M, Karalnik V, Petryakov A and Trushkin N 2010 J. Phys. D: Appl. Phys. 43 215202
-
(2010)
J. Phys. D: Appl. Phys.
, vol.43
, Issue.21
-
-
Akishev, Y.1
Grushin, M.2
Karalnik, V.3
Petryakov, A.4
Trushkin, N.5
-
34
-
-
80053403954
-
-
10.1063/1.3641413 121502
-
Xu D A, Lacoste D A, Rusterholtz D L, Elias P Q, Stancu G D and Laux C O 2011 Appl. Phys. Lett. 99 121502
-
(2011)
Appl. Phys. Lett.
, vol.99
-
-
Xu, D.A.1
Lacoste, D.A.2
Rusterholtz, D.L.3
Elias, P.Q.4
Stancu, G.D.5
Laux, C.O.6
-
36
-
-
84951890711
-
-
10.1063/1.555832
-
Atkinson R, Baulch D L, Cox R A, Hampson R F J, Kerr J A and Troe J 1989 J. Phys. Chem. Ref. Data 18 881-1097
-
(1989)
J. Phys. Chem. Ref. Data
, vol.18
, pp. 881-1097
-
-
Atkinson, R.1
Baulch, D.L.2
Cox, R.A.3
Hampson, R.F.J.4
Kerr, J.A.5
Troe, J.6
-
38
-
-
77950207347
-
-
10.1088/0963-0252/19/2/025018 0963-0252 025018
-
Liu D X, Bruggeman P, Iza F, Rong M Z and Kong M G 2010 Plasma Sources Sci. Technol. 19 025018
-
(2010)
Plasma Sources Sci. Technol.
, vol.19
, Issue.2
-
-
Liu, D.X.1
Bruggeman, P.2
Iza, F.3
Rong, M.Z.4
Kong, M.G.5
-
41
-
-
0031317005
-
-
10.1063/1.556010
-
Atkinson R, Baulch D L, Cox R A, Hampson R F, Kerr J A, Rossi M J and Troe J 1997 J. Phys. Chem. Ref. Data 26 1329-499
-
(1997)
J. Phys. Chem. Ref. Data
, vol.26
, pp. 1329-1499
-
-
Atkinson, R.1
Baulch, D.L.2
Cox, R.A.3
Hampson, R.F.4
Kerr, J.A.5
Rossi, M.J.6
Troe, J.7
-
46
-
-
34848902274
-
-
10.1134/S1063780X07090061
-
Akishev Y S, Grushin M E, Karalńik V B, Petryakov A V and Trushkin N I 2007 Plasma Phys. Rep. 33 757-73
-
(2007)
Plasma Phys. Rep.
, vol.33
, pp. 757-773
-
-
Akishev, Y.S.1
Grushin, M.E.2
Karalńik, V.B.3
Petryakov, A.V.4
Trushkin, N.I.5
-
48
-
-
0029356696
-
-
10.1109/27.467998 0093-3813
-
Gordiets B F, Ferreira C M, Guerra V L, Jorge M A H, Loureiro J N, Pagnon D, Touzeau M and M V 1995 IEEE Trans. Plasma Sci. 23 750-68
-
(1995)
IEEE Trans. Plasma Sci.
, vol.23
, pp. 750-768
-
-
Gordiets, B.F.1
Ferreira, C.M.2
Guerra, V.L.3
Jorge, M.A.H.4
Loureiro, J.N.5
Pagnon, D.6
Touzeau, M.7
-
50
-
-
79953719053
-
-
10.1088/0963-0252/20/2/024007 0963-0252 024007
-
Loureiro J, Guerra V, Sá P A, Pintassilgo C D and da Silva M L 2011 Plasma Sources Sci. Technol. 20 024007
-
(2011)
Plasma Sources Sci. Technol.
, vol.20
, Issue.2
-
-
Loureiro, J.1
Guerra, V.2
Sá, P.A.3
Pintassilgo, C.D.4
Da Silva, M.L.5
|