Corrigendum to “Effect of anions on the morphology of Co3O4 nanostructures grown by hydrothermal method and their pH sensing application” [Journal of Electroanalytical Chemistry 717–718 (2014) 78–82] (Journal of Electroanalytical Chemistry (2014) 717–718 (78–82), (S1572665714000186), (10.1016/j.jelechem.2014.01.011));Effect of anions on the morphology of Co3O4 nanostructures grown by hydrothermal method and their pH sensing application

Journal of Electroanalytical Chemistry

Volumn 717-718, Issue , 2014, Pages 78-82

  Hussain, Mushtaque ^a   Ibupoto, Zafar Hussain ^a   Abbasi, Mazhar Ali ^a   Nur, Omer ^a   Willander, Magnus ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

Anion effect; Cobalt oxide nanostructures; Morphology; pH sensor; Potentiometric response

Indexed keywords

CHLORINE COMPOUNDS; COBALT COMPOUNDS; COBALT DEPOSITS; ELECTRODES; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MORPHOLOGY; NANOSTRUCTURES; NEGATIVE IONS; PH EFFECTS; POTENTIOMETERS (ELECTRIC MEASURING INSTRUMENTS); SCANNING ELECTRON MICROSCOPY; TEMPERATURE;

ANION EFFECTS; COBALT OXIDES; FAST RESPONSE TIME; HYDROTHERMAL METHODS; MATERIAL CHARACTERIZATIONS; NERNSTIAN RESPONSE; POTENTIOMETRIC PH SENSORS; POTENTIOMETRIC RESPONSE;

PH SENSORS;

EID: 84893402919     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2020.114783     Document Type: Erratum

References (45)

1. X. Wang, X.Y. Chen, L.S. Gao, H.G. Zheng, Z. Zhang, and Y.T. Qian J. Phys. Chem. B 108 42 2004 16401 16404
2. J. Feng, and H.C. Zeng Chem. Mater. 15 14 2003 2829 2835
3. W.I. Park, and G.C. Yi Adv. Mater. 16 1 2004 87 90
4. M.C. Daniel, and D. Astruc Chem. Rev. 104 1 2004 293 346
5. N. Amin, and S. Arajs Phys. Rev. B 35 1987 4810 4811
6. W.W. Yu, and X.G. Peng Angew. Chem. Int. Ed. 41 2002 2368 2371
7. H. Li, R. Liu, R.X. Zhao, Y.F. Zheng, W.X. Chen, and Z.D. Xu Cryst. Growth. Des. 6 2006 2795 2798
8. A. Earnshaw, and N. Greenwood Chemistry of the Elements second ed. 1997 Butterworth-Heinemann UK
9. Y. Yu, C.H. Chen, J.L. Shui, and S. Xie Angew. Chem. Int. Ed. 44 2005 7085 7089
10. Y.G. Li, B. Tan, and Y.Y. Wu J. Am. Chem. Soc. 128 2006 14258 14259
11. T. Maruyama, and S. Arai J. Electrochem. Soc. 143 1996 1383 1386
12. L. Yan, X.M. Zhang, T. Ren, H.P. Zhang, X.L. Wang, and J.S. Suo Chem. Commun. 2002 860 861
13. E.M. Logothesis, R. Park, A.H. Meitzler, and K.K. Laud Appl. Phys. Lett. 26 1975 209 211
14. J. Wollenstein, M. Burgmair, G. Plescher, T. Sulima, J. Hildenbrand, H. Bottner, and I. Eisele Sens. Actuators B 93 2003 442 448
15. X. Yao, X. Xin, Y. Zhang, J. Wang, Z. Liu, and X. Xu J. Alloys Compd. 521 2012 95 100
16. B.Z. Tian, X.Y. Liu, H.F. Yang, S.H. Xie, C.Z. Yu, B. Tu, and D.Y. Zhao Adv. Mater. 15 2003 1370 1374
17. Y.K. Liu, G.H. Wang, C.K. Xu, and W.Z. Wang Chem. Commun. 14 2002 1486 1487
18. T. Li, S.G. Yang, L.S. Huang, B.X. Gu, and Y.W. Du Nanotechnology 15 2004 1479 1482
19. L.H. Hu, Q. Peng, and Y.D. Li J. Am. Chem. Soc. 130 2008 16136 16137
20. R. Xu, and H.C. Zeng J. Phys. Chem. B 107 2003 926 930
21. J. Feng, and H.C. Zeng Chem. Mater. 15 2003 2829 2835
22. T. He, D.R. Chen, X.L. Jiao, and Y.L. Wang Adv. Mater. 18 2006 1078 1082
23. A.M. Cao, J.S. Hu, H.P. Liang, W.G. Song, L.J. Wan, X.L. He, X.G. Gao, and S.H. Xia J. Phys. Chem. B 110 2006 15858 15863
24. T. Ozkaya, A. Baykal, Y. Koseoìglu, and H. Kavas Cent. Eur. J. Chem. 7 2009 410 411
25. F.F. Tao, C.L. Gao, Z.H. Wen, Q. Wang, J.H. Li, and Z. Xu J. Solid State Chem. 182 2009 1055 1060
26. Y.L. Hou, H.S. Kondoh, M.S. Shimojo, T. Kogure, and T. Ohta J. Phys. Chem. B 109 2005 19094 19098
27. T. Yu, Y.W. Zhu, X.J. Xu, Z.X. Shen, P. Chen, C.T. Lim, J.T.L. Thong, and C.H. Sow Adv. Mater. 17 2005 1595 1599
28. T. He, D. Chen, X. Jiao, Y. Wang, and Y. Duan Chem. Mater. 17 2005 4023 4030
29. G. Feng, L. Chunzhong, H. Yanjie, and Z. Ling J. Cryst. Growth. 304 2007 369 373
30. P. Dutta, M.S. Seehra, S. Thota, and J. Kumar J. Phys. Condes. Matter. 20 2008 015218 015223
31. J. Park, X. Shen, and G. Wang Sens. Actuators B Chem. 136 2009 494 498
32. Y. Chen, Y. Zhang, and S. Fu Mater. Lett. 61 3 Feb 2007 701 705
33. A. Morsali, H.H. Monfared, and M. Ali J. Mol. Struct. 938 2009 10 14
34. S.K. Meher, and G.R. Rao J. Phys. Chem. C 115 2011 25543 25556
35. W-M. Zhang, M. Chen, and Y-Q. Jiang Int. Nano. Lett. 3 2013 44 1-4
36. G. Wang, X. Shen, J. Horvat, B. Wang, H. Liu, D. Wexler, and J. Yao J. Phys. Chem. C 113 2009 4357 4361
37. S. Zhang, Y. Shen, H. Fang, S. Xu, J. Song, and Z.L. Wang J. Mater. Chem. 20 2010 10606 10610
38. X.H. Liu, G.Z. Qiu, and X.G. Li Nanotechnology 16 2005 3035 3040
39. H. Galster pH Measurements - Fundamentals, Methods, Applications, Instruments 1991 VCH Publishers New York
40. W. Göpel, T.A. Jones, M. Kleit, I. Lundström, and T. Seiyama Sensors - A Comprehensive Survey 1991 VCH New York
41. B. Lakard, O. Segut, S. Lakard, G. Herlem, and T. Gharbi Sens. Actuators B 122 2007 101 108
42. Y. Liu, and T. Cui Sens. Actuators B Chem. 123 2007 148 152
43. E. Gill, K. Arshak, A. Arshak, and O. Korostynska Microsyst. Technol. 14 2008 499 507
44. A. Fulati, S.M. Ali, M. Riaz, G. Amin, O. Nur, and M. Willander Sensors 9 2009 8911 8923
45. S.M. Al-Hilli, R.T. Al-Mofarji, P. Klason, M. Willander, N. Gutman, and A. Sa'ar J. Appl. Phys. 103 2008 014302 14307