Improvement of solvent affinity for graphene derivatives by solution plasma process

Japanese Journal of Applied Physics

Volumn 53, Issue 1 PART 2, 2014, Pages

  Uchino, Seiko ^a   Sakaguchi, Koichi ^a   Ohtake, Asami ^a   Takisawa, Noboru ^a   Nakashima, Tatsurou ^b   Era, Masanao ^a   Matsuda, Naoki ^b  

^a SAGA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE PARTICLE SIZE; DISPERSIBILITIES; EXPERIMENTAL PARAMETERS; NATURAL GRAPHITE; REACTION CONTROL; SOLUTION PLASMA PROCESS; SOLUTION PLASMAS; TREATMENT DURATION;

GRAPHITE; PARTICLE SIZE;

GRAPHENE;

EID: 84893279105     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAP.53.01AD05     Document Type: Article

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