Discharge character and optical emission in a laser ablation nanosecond discharge enhanced silicon plasma

Journal of Analytical Atomic Spectrometry

Volumn 28, Issue 5, 2013, Pages 702-710

  Zhou, Weidong ^a   Su, Xuejiao ^a   Qian, Huiguo ^a   Li, Kexue ^a   Li, Xiafen ^a   Yu, Youli ^a   Ren, Zhijun ^a  

^a ZHEJIANG NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC EMISSION SPECTROSCOPY; LASER ABLATION; LASER PRODUCED PLASMAS; LIGHT EMISSION; SILICON;

DISCHARGE STABILITY; DISCHARGE VOLTAGES; ELECTRON NUMBER DENSITIES; LASER INDUCED PLASMA; NANOSECOND DISCHARGE; RELATIVE STANDARD DEVIATIONS; STARK BROADENINGS; TEMPERATURE CALCULATION;

ELECTRIC DISCHARGES;

EID: 84891773880     PISSN: 02679477     EISSN: 13645544     Source Type: Journal    
DOI: 10.1039/c3ja30355a     Document Type: Article

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