Sulfur vacancies in monolayer MoS2 and its electrical contacts

Applied Physics Letters

Volumn 103, Issue 18, 2013, Pages

  Liu, D ^a   Guo, Y ^b   Fang, L ^a   Robertson, J ^b  

^a TSINGHUA UNIVERSITY   (China)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTION BAND EDGE; ELECTRICAL CONTACTS; FORMATION ENERGIES; HYBRID FUNCTIONAL; METAL CONTACTS; REACTIVE METALS; SCREENED EXCHANGES; SULFUR VACANCIES;

CONDUCTION BANDS; CONTACT RESISTANCE; MOLYBDENUM COMPOUNDS; MONOLAYERS; SULFUR;

VACANCIES;

EID: 84889634115     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4824893     Document Type: Article

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