Nanoporous gold by dealloying of an amorphous precursor

Journal of Alloys and Compounds

Volumn 586, Issue SUPPL. 1, 2014, Pages

  Rizzi, P ^a   Scaglione, F ^a   Battezzati, L ^a  

^a UNIVERSITY OF TURIN   (Italy)

Author keywords

Corrosion; Diffusion; Electrochemical reactions; Metallic glasses; Scanning electron microscopy (SEM)

Indexed keywords

CHLORINE COMPOUNDS; COPPER COMPOUNDS; CORROSION; DIFFUSION; ELECTROCHEMICAL CORROSION; GLASS; GOLD; GOLD COMPOUNDS; METALLIC GLASS; PALLADIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SILVER COMPOUNDS;

AMORPHOUS PRECURSORS; CHEMICAL AND PHYSICAL PROPERTIES; ELECTROCHEMICAL REACTIONS; GROWTH MECHANISMS; POLARIZATION CURVES; PORE MORPHOLOGY; RESULTING MATERIALS; SUITABLE CONDITIONS;

DEALLOYING;

EID: 84888861403     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2012.11.029     Document Type: Article

References (23)

1. X.Y. Lang, H. Guo, L.Y. Chen, A. Kudo, J.S. Yu, W. Zhang, A. Inoue, and M.W. Chen J. Phys. Chem. C 114 2010 2600 2603
2. A. Schaefer, D. Ragazzon, A. Wittstock, L.E. Walle, A. Borg, M. Baumer, and A. Sandel J. Phys. Chem. C 116 2012 4564 4571
3. H. Min, N. Sullivan, D. Allara, and S. Tadigadapa Procedia Eng. 25 2011 1469 1472
4. G. Li, X. Song, Z. Sun, S. Yang, B. Ding, S. Yang, Z. Yang, and F. Wang Solid State Sci. 13 2011 1379 1384
5. H.-J. Jin, and J. Weissmüller Adv. Eng. Mater. 12 2010 714 723
6. J. Erlebacher Phys. Rev. Lett. 106 2011 225504
7. J. Erlebacher, and R. Seshadri MRS Bull. 34 2009 561 568
8. S.V. Petegem, S. Brandstetter, R. Maass, A.M. Hodge, B.S. El-Dasher, J.r. Biener, B. Schmitt, C. Borca, and H.V. Swygenhoven Nano Lett. 9 2009 1158 1163
9. H.W. Pickering, and P.J. Byrne J. Electrochem. Soc. 118 1971 209 215
10. H.W. Pickering Corros. Sci. 23 1983 1107 1120
11. K. Sieradzki, N. Dimitrov, D. Movrin, C. McCall, N. Vasiljevic, and J. Erlebacher J. Electrochem. Soc. 149 2002 B370 B377
12. D.M. Artymowicz, J. Erlebacher, and R.C. Newman Phil. Mag. 89 2009 1663 1693
13. F. Scaglione, P. Rizzi, and L. Battezzati J. Alloys Comp. 536 Supp. 1 2012 S60 S64
14. G.S. Duffó, S.B. Farina, and J.R. Galvele Corros. Sci. 46 2004 1 4
15. J.D. Fritz, B.W. Parks, and H.W. Pickering Scr. Metall. 22 1988 1063 1068
16. K. Sieradzki, and R.C. Newman J. Phys. Chem. Solids 48 1987 1101 1113
17. S.M. Lutterotti, H.-R. Wenk, MAUD (Material Analysis Using Diffraction) is released under free license of the authors. Available at: http://www.ing.unitn.it/wmaud/index.html.
18. Z. Zhang, Y. Wang, Y. Wang, X. Wang, Z. Qi, H. Ji, and C. Zhao Scripta Mater. 62 2010 137 140
19. L.H. Qian, and M.W. Chen Appl. Phys. Lett. 91 2007 083105
20. G. Andreasen, M. Nazzarro, J. Ramirez, R.C. Salvarezza, and A.J. Arvia J. Electrochem. Soc. 143 1996 466 471
21. A. Dursun, D.V. Pugh, and S.G. Corcoran J. Electrochem. Soc. 150 2003 B355 B360
22. J.M. Dona, and J. Gonzalez Velasco J. Phys. Chem. 97 1993 4714 4719
23. M.P. García, M.M. Gómez, R.C. Salvarezza, and A.J. Arvia J. Electroanal. Chem. 347 1993 237 246