Oxidation of nonylphenol ethoxylates in aqueous solution by UV-C photolysis, H2O2/UV-C, Fenton and photo-Fenton processes: Are these processes toxicologically safe?

Water Science and Technology

Volumn 68, Issue 8, 2013, Pages 1801-1809

  Karci, Akin ^a   Arslan Alaton, Idil ^b   Bekbolet, Miray ^a  

^a BOGAZICI UNIVERSITY   (Turkey)

^b ISTANBUL TECHNICAL UNIVERSITY   (Turkey)

Author keywords

Acute toxicity; Alkylphenol ethoxylate; Fenton process; H2O 2 UV C process; Oxidation product; Photo Fenton process

Indexed keywords

ACUTE TOXICITY; ALKYL PHENOLS; FENTON PROCESS; OXIDATION PRODUCTS; PHOTO-FENTON PROCESS;

CARBOXYLIC ACIDS; DEGRADATION; OXIDATION; PHENOLS; PHOTOLYSIS;

TOXICITY;

ACETIC ACID; CARBOXYLIC ACID; FORMIC ACID; HYDROGEN PEROXIDE; NONYLPHENOL; NONYLPHENOL POLYETHOXYLATE; OXALIC ACID DERIVATIVE; UNCLASSIFIED DRUG;

ACETIC ACID; AQUEOUS SOLUTION; BACTERIUM; COMPARATIVE STUDY; DEGRADATION; FORMIC ACID; HYDROGEN PEROXIDE; INHIBITION; OXALIC ACID; OXIDATION; PHOTOLYSIS; TOTAL ORGANIC CARBON; TOXICITY; TOXICOLOGY;

ACUTE TOXICITY; AQUEOUS SOLUTION; ARTICLE; BACTERIAL GROWTH; CONTROLLED STUDY; FENTON REACTION; GROWTH INHIBITION; NONHUMAN; OXIDATION; PHOTODEGRADATION; PHOTOLYSIS; TOTAL ORGANIC CARBON; ULTRAVIOLET C RADIATION; VIBRIO FISCHERI; WASTE COMPONENT REMOVAL; WASTE WATER MANAGEMENT;

EID: 84888213836     PISSN: 02731223     EISSN: None     Source Type: Journal    
DOI: 10.2166/wst.2013.422     Document Type: Article

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