Plasma-induced decomposition of dichlorophenols and trichlorophenols in water by means of anodic contact glow discharge electrolysis

Plasma Chemistry and Plasma Processing

Volumn 33, Issue 6, 2013, Pages 1043-1052

  Yang, Haiming ^a,b   Caixia, ^b   Tezuka, Meguru ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY LIAONING   (China)

^b SAITAMA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Chlorophenols; Contact glow discharge electrolysis; Decomposition; First order rate law; pKa

Indexed keywords

CHLORINE COMPOUNDS; DECOMPOSITION; ELECTROLYSIS; GLOW DISCHARGES; ORGANIC CARBON; PHENOLS; RATE CONSTANTS;

1 ,4 HYDROQUINONES; 1 ,4-BENZOQUINONE; APPARENT RATE CONSTANT; CHLOROPHENOLS; CONTACT GLOW DISCHARGE ELECTROLYSIS; FIRST-ORDER RATES; INORGANIC CARBON; TOTAL ORGANIC CARBON;

DECAY (ORGANIC);

EID: 84888145239     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-013-9481-5     Document Type: Article

References (25)

1. Hickling A, Ingram MD (1964) Trans Faraday Soc 60:783
2. Hickling A (1971) In: Bockris JOM, Conway BE (eds) Modern aspects of electrochemistry, vol 6. Butterworths, London, p 329
3. Sengupta SK, Singh OP (1991) J Electroanal Chem 301:189
4. Gangal U, Srivastava M, Sen Gupta SK (2009) J Electrochem Soc 156:131
5. Gangal U, Srivastava M, Sen Gupta SK (2010) Plasma Chem Plasma Process 30(2):299
6. Wang X, Zhou M, Jin X (2012) Electrochim Acta 83:501
7. Almubarak MA, Wood A (1977) J Electrochem Soc 124:1356
8. Bullock AT, Gavin DL, Ingram MD (1980) J Chem Soc, Faraday Trans 76:648
9. Sengupta SK, Singh OP (1994) J Electroanal Chem 369:113
10. Sengupta SK, Singh R, Srivastava AK (1998) J Electrochem Soc 145:2209
11. Sengupta SK, Singh R, Srivastava AK (1998) Indian J Chem 37:558
12. Mazzocchin GA, Bontempelli G, Magno F (1973) J Electroanal Chem Interfacial Electrochem 42:243
13. Liu YJ (2009) J Hazard Mater 166:1495
14. Gong JY, Wang J, Xie WJ, Cai WM (2008) J Appl Electrochem 38:1749
15. Jin XL, Wang XY, Zhang HM, Xia Q, Wei DB, Yue JJ (2010) Plasma Chem Plasma Process 30:429
16. Tezuka M, Iwasaki M (1997) Denki Kagaku 65:1057
17. Tezuka M, Iwasaki M (1999) Plasma Ions 1:23
18. Tezuka M, Iwasaki M (2001) Thin Solid Films 386:204
19. Amano R, Tomizawa S, Tezuka M (2004) Electrochemistry 72:836
20. Amano R, Tezuka M (2006) Water Res 40:1857
21. Tomizawa S, Tezuka M (2007) Plasma Chem Plasma Process 27:486
22. Yang HM, An BG, Wang SY, Li LX, Jin WJ, Li LH (2013) J Environ Sci 25(6):1
23. Yang HM, Matsumoto Y, Tezuka M (2009) J Environ Sci 21(Suppl 1):S142
24. Yang HM, Tezuka M (2011) J Phys D Appl Phys 44:155203
25. Yang HM, Tezuka M (2011) J Environ Sci 23:1044