Electrochemical reductive dechlorination of trichloroacetic acid on porous Ag-Pd thin foam

Russian Journal of Electrochemistry

Volumn 49, Issue 11, 2013, Pages 1081-1085

  Jin, Ming ^a,b   Ma, Houyi ^a  

^a SHANDONG UNIVERSITY   (China)

^b QUFU NORMAL UNIVERSITY   (China)

Author keywords

Ag; dechlorination; hydrogen bubble template; Pd; trichloroacetic acid

Indexed keywords

DEPOSITION CONDITIONS; ELECTROCATALYTIC ACTIVITY; ELECTROCATALYTIC PERFORMANCE; ELECTROLYTIC SOLUTION; HYDROGEN BUBBLE TEMPLATES; MORPHOLOGY AND COMPOSITION; ONE-STEP ELECTRODEPOSITIONS; REDUCTIVE DECHLORINATION;

CYCLIC VOLTAMMETRY; DEPOSITION; HYDROGEN; MORPHOLOGY; PALLADIUM; SILVER; SILVER ALLOYS; TRICHLOROACETIC ACID;

DECHLORINATION;

EID: 84887948164     PISSN: 10231935     EISSN: 16083342     Source Type: Journal    
DOI: 10.1134/S1023193513110153     Document Type: Article

References (21)

1. Major, D.W., McMaster, M.L., and Cox, E.E., Environ. Sci. Technol., 2002, vol. 23, p. 5106.
2. Serpone, N., Texier, I., Emeline, A.V., Pichat, P., Hidaka, H., and Zhao, J., J. Photoch. Photobio., Ser. A, 2000, vol. 136, p. 145.
3. Liu, Y., Majetich, S.A., Tilton, R.D., Sholl, D.S., and Lowry, G.V., Environ. Sci. Technol., 2005, vol. 39, p. 1338.
4. Jiao, Y., Wu, D., Ma, H., Qiu, C., Zhang, J., and Ma, L., Electrochem. Commun., 2005, vol. 44, p. 1474.
5. Xu, Y.H., Zhang, H., Chu, C.P., and Ma, C.A., J. Electroanal. Chem., 2012, vol. 664, p. 39.
6. Liu, B., Hu, X., Deng, Y., Yang, S., and Sun, C., Electrochem Commun., 2010, vol. 12, p. 1395.
7. Ma, C., Ma, H., Xu, Y., Chu, Y., and Zhao, F., Electrochem. Commun., 2009, vol. 11, p. 2133.
8. Hoshi, N., Maruyama, N., and Chiba, N., Electrochemistry, 2005, vol. 73, p. 424.
9. Hoshi, N. and Nozu, D., Electrochemistry, 2006, vol. 74, p. 593.
10. Patel, U.D. and Suresh, S., J. Hazard. Mater., 2008, vol. 156, p. 308.
11. Isse, A.A., Falciola, L., Mussinini, P.R., and Gennaro, A., Chem. Commun., 2006, p. 344.
12. Huang, Y.F., Wu, D.Y., Wang, A., Ren, B., Rondinini, S., Tian, Z.Q., and Amatore, C., J. Am. Chem. Soc., 2012, vol. 132, p. 17199.
13. Isse, A.A., Mussini, P.R., and Gennaro, A., J. Phys. Chem., Ser. C, 2009, vol. 113, p. 14983.
14. Shin, H.-C., Dong, J., and Liu, M., Adv. Mater., 2003, vol. 15, p. 1610.
15. Plowman, B.J., O'Mullane, A.P., Selvakannan, P., and Bhargava, S.K., Chem. Commun., 2010, vol. 46, p. 9182.
16. Najdovski, I., Selvakannan, P., O'Mullane, A.P., and Bhargava, S.K., Chem. Eur. J., 2011, vol. 17, p. 10058.
17. Cherevko, S., Xing, X., and Chung, C.-H., Electrochem. Commun., 2010, vol. 12, p. 467.
18. Cherevko, S. and Chung, C.-H., Electrochem. Commun., 2011, vol. 13, p. 16.
19. Huang, W., Fu, L., Yang, Y., Hu, S., Li, C., and Li, Z., Electrochem. Solid. State Lett., 2010, vol. 13, p. K46.
20. Jia, W.Z., Wang, K., Zhu, Z.J., Song, H.T., and Xia, X.H., Langmuir, 2007, vol. 23, p. 11896.
21. Shin, H.-C. and Liu, M., Chem. Mater., 2004, vol. 16, p. 5460.