-
4
-
-
0027180889
-
-
Sharma A K, Locke B R, Arce P, et al. 1993, Hazardous Waste and Hazardous Materials, 10: 209
-
(1993)
Hazardous Waste and Hazardous Materials
, vol.10
, pp. 209
-
-
Sharma, A.K.1
Locke, B.R.2
Arce, P.3
-
5
-
-
0035333136
-
-
Yan K, Van Heesch E J M, Pemen A J M, et al. 2001, Journal of Electrostatics, 51~52: 218
-
(2001)
Journal of Electrostatics
, vol.51-52
, pp. 218
-
-
Yan, K.1
Van Heesch, E.J.M.2
Pemen, A.J.M.3
-
6
-
-
0034247893
-
-
Hoeben W F L M, Van Veldhuizen E M, Rutgers W R, et al. 2000, Plasma Sources Sci. Technol., 9: 361
-
(2000)
Plasma Sources Sci. Technol.
, vol.9
, pp. 361
-
-
Hoeben, W.F.L.M.1
Van Veldhuizen, E.M.2
Rutgers, W.R.3
-
11
-
-
0028924449
-
-
Joshi A A, Locke B R, Arce P, et al. 1995, J. Hazardous Materials, 41: 3
-
(1995)
J. Hazardous Materials
, vol.41
, pp. 3
-
-
Joshi, A.A.1
Locke, B.R.2
Arce, P.3
-
12
-
-
0032045839
-
-
Sun B, Sato M, Harano A, et al. 1998, Journal of Electrostatics, 43: 115
-
(1998)
Journal of Electrostatics
, vol.43
, pp. 115
-
-
Sun, B.1
Sato, M.2
Harano, A.3
-
13
-
-
0038072668
-
-
Ye Q Z, Wan H, Lei Y, et al. 2003, High Voltage Engineering, 29: 32
-
(2003)
High Voltage Engineering
, vol.29
, pp. 32
-
-
Ye, Q.Z.1
Wan, H.2
Lei, Y.3
-
15
-
-
1942484976
-
-
Grymonpre D R, Finney W C, Clark R J, et al. 2004, Ind. Eng. Chem. Res., 43: 1975
-
(2004)
Ind. Eng. Chem. Res.
, vol.43
, pp. 1975
-
-
Grymonpre, D.R.1
Finney, W.C.2
Clark, R.J.3
-
18
-
-
23044516142
-
-
Miichi T, Hayashi N, Ihara S, et al. 2002, Ozone Science and Engineering, 24: 471
-
(2002)
Ozone Science and Engineering
, vol.24
, pp. 471
-
-
Miichi, T.1
Hayashi, N.2
Ihara, S.3
-
20
-
-
0037403660
-
-
Sugiarto A T, Ito S, Ohshima T, et al. 2003, Journal of Electrostatic, 58: 135
-
(2003)
Journal of Electrostatic
, vol.58
, pp. 135
-
-
Sugiarto, A.T.1
Ito, S.2
Ohshima, T.3
-
25
-
-
84887748576
-
-
SamaranayakeWJ M, Miyahara Y, Namihira T, et al. 2000, IEEE T. Dielect. El. In., 7: 524
-
(2000)
IEEE T. Dielect. El. In.
, vol.7
, pp. 524
-
-
Samaranayake, W.J.M.1
Miyahara, Y.2
Namihira, T.3
-
27
-
-
33846200733
-
-
Zhang Y, Zhou M H, Hao X L, et al. 2007, Chemosphere, 67: 702
-
(2007)
Chemosphere
, vol.67
, pp. 702
-
-
Zhang, Y.1
Zhou, M.H.2
Hao, X.L.3
-
28
-
-
13844255821
-
-
Lukes P, Clupek M, Babicky V, et al. 2005, Journal of Physics D: Applied Physics, 38: 409
-
(2005)
Journal of Physics D: Applied Physics
, vol.38
, pp. 409
-
-
Lukes, P.1
Clupek, M.2
Babicky, V.3
-
29
-
-
0036671792
-
-
Malik M A, Rehman U, Ghaffar A, et al. 2002, Plasma Sources Sci. Technol., 11: 236
-
(2002)
Plasma Sources Sci. Technol.
, vol.11
, pp. 236
-
-
Malik, M.A.1
Rehman, U.2
Ghaffar, A.3
-
30
-
-
77951004658
-
-
Li L Y, Ye Q Z, Xie Z H, et al. 2004, High Voltage Apparatus, 41: 101
-
(2004)
High Voltage Apparatus
, vol.41
, pp. 101
-
-
Li, L.Y.1
Ye, Q.Z.2
Xie, Z.H.3
-
31
-
-
33947156181
-
-
Zhang R B, Zhang C, Cheng X X, et al. 2007, Journal of Hazardous Materials, 142: 105
-
(2007)
Journal of Hazardous Materials
, vol.142
, pp. 105
-
-
Zhang, R.B.1
Zhang, C.2
Cheng, X.X.3
-
32
-
-
1642529552
-
-
Chen Y S, Zhang X S, Dai Y C, et al. 2004, Separation and Purification Technology, 34: 5
-
(2004)
Separation and Purification Technology
, vol.34
, pp. 5
-
-
Chen, Y.S.1
Zhang, X.S.2
Dai, Y.C.3
-
33
-
-
84860632681
-
-
Lukes P, Clupek M, Babicky V, et al. 2008, Plasma Sources Sci. Technol., 17: 1
-
(2008)
Plasma Sources Sci. Technol.
, vol.17
, pp. 1
-
-
Lukes, P.1
Clupek, M.2
Babicky, V.3
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