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Angewandte Chemie - International Edition

Volumn 52, Issue 47, 2013, Pages 12381-12384

Reliable metal deposition into TiO2 nanotubes for leakage-free interdigitated electrode structures and use as a memristive electrode

(3) Liu, Ning a Lee, Kiyoung a Schmuki, Patrik a

a UNIVERSITY OF ERLANGEN NUREMBERG (Germany)

Author keywords

electrodeposition; electrodes; sealing layer; semiconductors; TiO2 nanotubes

Indexed keywords

INTER-DIGITATED ELECTRODES; METAL DEPOSITION; NUCLEI FORMATION; SEALING LAYERS; TIO;

DEPOSITION; ELECTRODEPOSITION; ELECTRODES; SEMICONDUCTOR MATERIALS; TITANIUM DIOXIDE;

NANOTUBES;

EID: 84887556015 PISSN: 14337851 EISSN: 15213773 Source Type: Journal
DOI: 10.1002/anie.201306334 Document Type: Article

Times cited : (33)

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