A ferromagnetic insulating substrate for the epitaxial growth of topological insulators

Journal of Applied Physics

Volumn 114, Issue 11, 2013, Pages

  Ji, Huiwen ^a   Stokes, R A ^a   Alegria, L D ^a   Blomberg, E C ^b   Tanatar, M A ^b   Reijnders, Anjan ^c   Schoop, L M ^a   Liang, Tian ^a   Prozorov, R ^b   Burch, K S ^c,d   Ong, N P ^a   Petta, J R ^a   Cava, R J ^a  

^a PRINCETON UNIVERSITY   (United States)

^b IOWA STATE UNIVERSITY   (United States)

^c UNIVERSITY OF TORONTO   (Canada)

^d Department of Materials Science and Engineering ^*  (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

FERROMAGNETIC INSULATING; FERROMAGNETIC SUBSTRATE; FERROMAGNETS; INDIRECT BAND GAP; LARGE LENGTH-SCALE; TOPOLOGICAL INSULATORS;

CHEMICAL VAPOR DEPOSITION; ELECTRONIC PROPERTIES; EPITAXIAL GROWTH; FERROMAGNETIC MATERIALS; FERROMAGNETISM; GERMANIUM; MAGNETIC DOMAINS;

ELECTRIC INSULATORS;

EID: 84887433993     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4822092     Document Type: Article

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