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Volumn , Issue , 2006, Pages 141-144

Significant step in wafer yield optimization and operation cost reduction due to dicing innovation

Author keywords

Die strength; Laser dicing; Multiple beam dicing

Indexed keywords

DIE STRENGTH; ELECTRICAL PERFORMANCE; LASER DICING; MULTIPLE BEAM; MULTIPLE BEAM LASERS; PROCESS CAPABILITIES; QUALITY DETERIORATIONS; SEMICONDUCTOR COMPONENTS;

EID: 84887420421     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (6)

References (2)
  • 1
    • 34547731315 scopus 로고    scopus 로고
    • ALSI's low power multiple beam technology for high throughput and low damage wafer dicing
    • Japan Laser Processing Society
    • P. Chall, "ALSI's Low Power Multiple Beam Technology for High Throughput and Low Damage Wafer Dicing", in Proceedings of the 65th Laser Materials Processing Conference, Japan Laser Processing Society, pp. 197-200, 2005.
    • (2005) th Laser Materials Processing Conference , pp. 197-200
    • Chall, P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.