The effect of H2-CCl4 mixture plasma treatment on TiO2 photocatalytic oxidation of aromatic air contaminants under both UV and visible light

Chemical Engineering Journal

Volumn 236, Issue , 2014, Pages 285-292

  Hu, Shaozheng ^a   Li, Fayun ^a   Fan, Zhiping ^a   Gui, Jianzhou ^a  

^a LIAONING SHIHUA UNIVERSITY   (China)

Author keywords

Carbon doping; Chlorine radical; H2 CCl4 plasma; Photocatalysis; TiO2

Indexed keywords

BENZENE AND TOLUENE; CARBON DOPING; CHLORINE RADICALS; PHOTOCATALYTIC OXIDATIONS; POSSIBLE MECHANISMS; TIO; UV AND VISIBLE LIGHT; UV-VIS SPECTROSCOPY;

AROMATIC COMPOUNDS; AROMATIZATION; BENZENE; CARBON; CATALYSTS; CHLORINE; MIXTURES; OXIDATION; PHOTOCATALYSIS; PHOTOELECTRONS; PLASMA APPLICATIONS; PLASMAS; TEMPERATURE PROGRAMMED DESORPTION; TOLUENE; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM DIOXIDE;

EID: 84886690276     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2013.09.098     Document Type: Article

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