Suppressed short-channel effects and improved stability in polysilicon thin film transistors with very thin ECR N2O-plasma gate oxide

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 1997, Pages 519-522

  Lee, Jin Woo ^a   Lee, Nae In ^a   Hur, Sung Hoi ^a   Han, Chul Hi ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL STRESS; SHORT CHANNEL POLYSILICON THIN FILM TRANSISTORS;

ELECTRIC CURRENTS; ELECTRON CYCLOTRON RESONANCE; GATES (TRANSISTOR); PLASMA APPLICATIONS; POLYCRYSTALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; STRESSES;

THIN FILM TRANSISTORS;

EID: 84886447981     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)