Photophysical properties of Alq3 thin films

Optical Materials

Volumn 36, Issue 1, 2013, Pages 91-97

  Zawadzka, A ^a   Plociennik P ^a   Strzelecki, J ^a   Lukasiak Z ^a   Sahraoui, B ^b  

^a NICOLAUS COPERNICUS UNIVERSITY   (Poland)

^b UNIVERSITÉ D'ANGERS   (France)

Author keywords

Aluminum (III) tris(8 hydroxyquinoline) thin films; Photoluminescence; Physical Vapor Deposition; SHG; THG; Transmission

Indexed keywords

ALUMINUM COATINGS; ALUMINUM COMPOUNDS; ANNEALING; ATMOSPHERIC TEMPERATURE; HARMONIC GENERATION; PHOTOLUMINESCENCE; PHYSICAL VAPOR DEPOSITION; SILICA; SUBSTRATES; TRANSMISSIONS;

AMBIENT ATMOSPHERE; ANNEALING PROCESS; DEPOSITION PROCESS; PHOTOPHYSICAL PROPERTIES; SECOND AND THIRD HARMONICS; STRUCTURAL QUALITIES; TRIS(8-HYDROXYQUINOLINE); VAPOR-DEPOSITION TECHNIQUES;

THIN FILMS;

EID: 84886309448     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2013.05.001     Document Type: Article

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