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Volumn 46, Issue 42, 2013, Pages

Extremely high wear resistance and ultra-low friction behaviour of oxygen-plasma-treated nanocrystalline diamond films

(10) Radhika, R a Kumar, N b Sankaran, K J c Dumpala, Ravikumar d Dash, S b Ramachandra Rao, M S d Arivuoli, D a Tyagi, A K b Tai, N H c Lin, I Nan e

a ANNA UNIVERSITY (India)

b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH (India)

c NATIONAL TSING HUA UNIVERSITY (Taiwan)

d INDIAN INSTITUTE OF TECHNOLOGY MADRAS (India)

e TAMKANG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON (A-C); FRICTION COEFFICIENTS; HIGH WEAR RESISTANCE; MICROSTRUCTURAL MODIFICATION; NANOCRYSTALLINE DIAMOND FILMS; OXYGEN CONTAINING GROUPS; PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITIONS; TRIBOLOGICAL PROPERTIES;

AMORPHOUS CARBON; FUNCTIONAL GROUPS; HYDROGEN BONDS; HYDROPHILICITY; NANOWIRES; OXYGEN; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; TRIBOLOGY; VAN DER WAALS FORCES; WEAR OF MATERIALS; WEAR RESISTANCE;

PLASMAS;

EID: 84885987123 PISSN: 00223727 EISSN: 13616463 Source Type: Journal
DOI: 10.1088/0022-3727/46/42/425304 Document Type: Article

Times cited : (17)

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