Magnetoelectrodeposition for the chiral surface formation of Cu films

ECS Transactions

Volumn 45, Issue 12, 2012, Pages 1-8

  Mogi, I ^a   Aogaki, R ^b   Morimoto, R ^c   Watanabe, K ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b POLYTECHNIC UNIVERSITY   (Japan)

^c Saitama Prefectural Okubo Water Filtration Plant   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMINO ACIDS; ELECTROCHEMISTRY; ELECTRODEPOSITION; ENANTIOMERS; MAGNETIC FIELDS; MAGNETS; METALLIC FILMS;

CONSTANT POTENTIAL; CYCLIC VOLTAMMOGRAMS; DISC ELECTRODES; ELECTROCHEMICAL REACTIONS; GALVANOSTATICS; MAGNETOELECTRODEPOSITION; OXIDATION CURRENTS; PULSE ELECTRODEPOSITION;

ELECTROCHEMICAL ELECTRODES;

EID: 84885782579     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/04512.0001ecst     Document Type: Conference Paper

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