Fabrication of a polymer high-aspect-ratio pillar array using UV imprinting

Micromachines

Volumn 4, Issue 2, 2013, Pages 157-167

  Shinohara, Hidetoshi ^a   Goto, Hiroshi ^a   Kasahara, Takashi ^b   Mizuno, Jun ^b  

^a Toshiba Machine Co Ltd   (Japan)

^b WASEDA UNIVERSITY   (Japan)

Author keywords

High aspect ratio; Polydimethylsiloxane; Resin mold; UV imprinting

Indexed keywords

HIGH ASPECT RATIO; HIGH FLEXIBILITY; POLYDIMETHYLSILOXANE PDMS; POLYETHYLENE TEREPHTHALATES (PET); REDUCED PRESSURE; UV IMPRINTING; UV-CURABLE RESINS; UV-LIGHT IRRADIATION;

ATMOSPHERIC PRESSURE; CURING; MICROCHANNELS; MOLDS; POLYDIMETHYLSILOXANE; RESINS; SILICONES;

ASPECT RATIO;

EID: 84885152242     PISSN: None     EISSN: 2072666X     Source Type: Journal    
DOI: 10.3390/mi4020157     Document Type: Article

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