Photo-sensitive RAFT-agents for advanced microparticle design

Macromolecules

Volumn 46, Issue 17, 2013, Pages 6858-6872

  Kaupp, Michael ^a,b   Tischer, Thomas ^a,b   Hirschbiel, Astrid F ^a,b   Vogt, Andrew P ^a,b   Geckle, Udo ^b   Trouillet, Vanessa ^b   Hofe, Thorsten ^c   Stenzel, Martina H ^d   Barner Kowollik, Christopher ^a,b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^c Polymer Standards Service GmbH   (Germany)

^d UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT CONDITIONS; ATTENUATED TOTAL REFLECTANCE; N ,N-DIMETHYLACRYLAMIDE; PICKERING EMULSIONS; POLY(GLYCIDYL METHACRYLATE); POLY(N ,N-DIMETHYLACRYLAMIDE); PREFUNCTIONALIZATION; REVERSIBLE ADDITION-FRAGMENTATION CHAIN TRANSFER POLYMERIZATION;

ACRYLIC MONOMERS; CHAINS; DESIGN; EMULSIFICATION; FREE RADICAL POLYMERIZATION; MICROSPHERES; PHOTOELECTRONS; POLYMERS; SCANNING ELECTRON MICROSCOPY; STYRENE; X RAY PHOTOELECTRON SPECTROSCOPY;

GRAFTING (CHEMICAL);

EID: 84884195003     PISSN: 00249297     EISSN: 15205835     Source Type: Journal    
DOI: 10.1021/ma401242g     Document Type: Article

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