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Journal of Renewable and Sustainable Energy

Volumn 5, Issue 4, 2013, Pages

A dip coating process for large area silicon-doped high performance hematite photoanodes

(7) Hu, Yelin a,b Bora, Debajeet K a,c,d Boudoire, Florent a,c Häussler, Florian e Graetzel, Michael b Constable, Edwin C c Braun, Artur a

a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY (Switzerland)

b EPFL (Switzerland)

c UNIVERSITY OF BASEL (Switzerland)

d LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

e TU BERGAKADEMIE FREIBERG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COUNTER ELECTRODES; DIP-COATING PROCESS; HYDROGEN EVOLUTION; PHOTOCURRENT DENSITY; REVERSIBLE HYDROGEN ELECTRODES; SOLAR WATER SPLITTING; TETRAETHYL ORTHOSILICATES; TRANSPARENT CONDUCTING OXIDE;

HEMATITE; HYDROGEN; HYDROGEN PRODUCTION; SILICON; SILICON OXIDES; SUBSTRATES;

COATINGS;

EID: 84884190278 PISSN: 19417012 EISSN: None Source Type: Journal
DOI: 10.1063/1.4812831 Document Type: Article

Times cited : (23)

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