Growth of TiO2/Cu films by HiPIMS for accelerated bacterial loss of viability

Surface and Coatings Technology

Volumn 232, Issue , 2013, Pages 804-813

  Rtimi, Sami ^a   Baghriche, Oualid ^a   Pulgarin, Cesar ^a   Lavanchy, Jean Claude ^b   Kiwi, John ^a  

^a EPFL   (Switzerland)

^b UNIVERSITY OF LAUSANNE   (Switzerland)

Author keywords

Coating thickness; E. coli viability; HIPIMS sputtering; ICP MS; Metal savings; Nano composite layers

Indexed keywords

COATING THICKNESS; E. COLI; ICP-MS; METAL SAVING; NANO-COMPOSITE LAYERS;

COMPOSITE FILMS; ESCHERICHIA COLI; FILM PREPARATION; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; MAGNETRONS; MASS SPECTROMETERS; METALLIC FILMS; THICKNESS MEASUREMENT; TITANIUM DIOXIDE; ULTRATHIN FILMS;

COPPER;

EID: 84883449720     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.06.102     Document Type: Article

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