Self-cleaning poly(dimethylsiloxane) film with functional micro/nano hierarchical structures

Langmuir

Volumn 29, Issue 34, 2013, Pages 10769-10775

  Zhang, Xiao Sheng ^a   Zhu, Fu Yun ^a   Han, Meng Di ^a   Sun, Xu Ming ^a   Peng, Xu Hua ^a   Zhang, Hai Xia ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP REACTIVE ION ETCHING; FINITE ELEMENT SIMULATIONS; FIRST PRINCIPLE CALCULATIONS; HIERARCHICAL STRUCTURES; MULTI-SCALE STRUCTURES; POLYDIMETHYLSILOXANE PDMS; POST-TREATMENT PROCESS; WAFER-LEVEL FABRICATION;

CHEMICAL MODIFICATION; COATINGS; FABRICATION; FLUORINE; HYDROPHOBICITY; PASSIVATION; PLASMA APPLICATIONS; PLASTIC FILMS; SILICON WAFERS;

MICROCHANNELS;

BAYSILON; DIMETICONE; NANOMATERIAL; POLYMER;

ARTICLE; CHEMISTRY; SCANNING ELECTROCHEMICAL MICROSCOPY; SURFACE PROPERTY; ULTRASTRUCTURE;

DIMETHYLPOLYSILOXANES; MICROSCOPY, ELECTROCHEMICAL, SCANNING; NANOSTRUCTURES; POLYMERS; SURFACE PROPERTIES;

EID: 84883247511     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la4023745     Document Type: Article

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