Copper Passivity in Carbonate Base Solutions and its Application in Chemical Mechanical Planarization (CMP)

Passivation of Metals and Semiconductors, and Properties of Thin Oxide Layers

Volumn , Issue , 2006, Pages 125-130

  Abelev, E ^a   Starosvetsky, D ^a   Auinat, M ^a   Ein Eli, Y ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

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[No Author keywords available]

Indexed keywords

EID: 84882866810     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1016/B978-044452224-5/50021-4     Document Type: Chapter

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