The first thin film ellipsometry at a photon energy of 97eV with use of high performance multilayer polarizers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2873, Issue , 1996, Pages 70-73

  Yamamoto, M ^a   Mayama, K ^b   Kimura, H ^b   Furudate, M ^a   Yanagihara, M ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b Japan Synchrotron Rad Res Inst   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; EXTREME ULTRAVIOLET LITHOGRAPHY; MULTILAYERS; OPTICAL INSTRUMENTS; PHOTONS; POLARIZATION;

ATOMIC SENSITIVITY; EXTREME ULTRAVIOLETS; MULTILAYER POLARIZERS; MULTILAYER STRUCTURES; PHOTON ENERGY; POLARIZING ELEMENTS;

FILM PREPARATION;

EID: 84882866683     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.246183     Document Type: Conference Paper

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