Reversible recovery of nanoimprinted polymer structures

Langmuir

Volumn 29, Issue 33, 2013, Pages 10498-10504

  Kustandi, Tanu Suryadi ^a   Loh, Wei Wei ^a   Shen, Lu ^a   Low, Hong Yee ^a,b  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b SINGAPORE UNIVERSITY OF TECHNOLOGY AND DESIGN   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH ASPECT RATIO; MICRO AND NANOSTRUCTURES; NANO-METER-SCALE; NANOIMPRINT PROCESS; PERMANENT SHAPES; POLYMER STRUCTURE; SHAPE MEMORY POLYMERS; SURFACE TEXTURES;

ASPECT RATIO; REPAIR; SHAPE OPTIMIZATION; TEXTURES;

RECOVERY;

EID: 84882685120     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la401621j     Document Type: Article

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