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Volumn , Issue , 2007, Pages 383-407

Resonance Elastic and Inelastic X-ray Scattering Processes for In-situ Investigation of Electrochemical Interfaces

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EID: 84882503899     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1016/B978-044451870-5/50013-0     Document Type: Chapter
Times cited : (2)

References (53)
  • 32
    • 0004134104 scopus 로고
    • Ch. 15, IUCr/Oxford University Press, Chester/Oxford, England
    • Fanchon E., Hendrickson W.A. Crystallographic Computing 1991, Vol. 5. Ch. 15, IUCr/Oxford University Press, Chester/Oxford, England.
    • (1991) Crystallographic Computing , vol.5
    • Fanchon, E.1    Hendrickson, W.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.