SCOPUS 정보 검색 플랫폼

Physics of Plasmas

Volumn 20, Issue 7, 2013, Pages

Influence of driving frequency on discharge modes in a dielectric-barrier discharge with multiple current pulses

(5) Jiang, Weiman a Tang, Jie a Wang, Yishan a Zhao, Wei a Duan, Yixiang a,b

a XI AN INSTITUTE OF OPTICS AND PRECISION MECHANICS (China)

b SICHUAN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON DISCHARGES; DIELECTRIC-BARRIER DISCHARGES; DRIVING FREQUENCIES; ELECTRICAL CHARACTERISTIC; ELECTRON ENERGIES; MULTIPLE CURRENTS; PLASMA CHEMISTRIES; TEMPORAL EVOLUTION;

ELECTRIC FIELDS;

GLOW DISCHARGES;

EID: 84882268579 PISSN: 1070664X EISSN: None Source Type: Journal
DOI: 10.1063/1.4817289 Document Type: Article

Times cited : (35)

References (30)

1
- 0036860831
- 10.1088/0963-0252/11/4/304
- E. Stoffels, A. J. Flikweert, W. W. Stoffels, and G. M. W. Kroesen, Plasma Sources Sci. Technol. 11, 383 (2002). 10.1088/0963-0252/11/4/304
- (2002) Plasma Sources Sci. Technol. , vol.11 , pp. 383
- Stoffels, E.¹ Flikweert, A.J.² Stoffels, W.W.³ Kroesen, G.M.W.⁴

2
- 14544308502
- 10.1088/0022-3727/38/4/007
- J. R. Roth, J. Rahel, X. Dai, and D. M. Sherman, J. Phys. D: Appl. Phys. 38, 555 (2005). 10.1088/0022-3727/38/4/007
- (2005) J. Phys. D: Appl. Phys. , vol.38 , pp. 555
- Roth, J.R.¹ Rahel, J.² Dai, X.³ Sherman, D.M.⁴

3
- 77953003450
- 10.1063/1.3431392
- J. Y. Kim, S. O. Kim, Y. Z. Wei, and J. H. Li, Appl. Phys. Lett. 96, 203701 (2010). 10.1063/1.3431392
- (2010) Appl. Phys. Lett. , vol.96 , pp. 203701
- Kim, J.Y.¹ Kim, S.O.² Wei, Y.Z.³ Li, J.H.⁴

4
- 78650906316
- 10.1063/1.3526678
- Z. Xiong, X. P. Lu, A. Feng, Y. Pan, and K. Ostrikov, Phys. Plasmas 17, 123502 (2010). 10.1063/1.3526678
- (2010) Phys. Plasmas , vol.17 , pp. 123502
- Xiong, Z.¹ Lu, X.P.² Feng, A.³ Pan, Y.⁴ Ostrikov, K.⁵

5
- 77956252002
- 10.1002/ppa200900175
- P. Rajasekaran, P. Mertmann, N. Bibinov, D. Wandke, W. Viol, and P. Awakowicz, Plasma Processes Polym. 7, 665 (2010). 10.1002/ppap.200900175
- (2010) Plasma Processes Polym. , vol.7 , pp. 665
- Rajasekaran, P.¹ Mertmann, P.² Bibinov, N.³ Wandke, D.⁴ Viol, W.⁵ Awakowicz, P.⁶

6
- 84863308149
- 10.1063/1.4729818
- J. Tang, S. Li, W. Zhao, Y. Wang, and Y. Duan, Appl. Phys. Lett. 100, 253505 (2012). 10.1063/1.4729818
- (2012) Appl. Phys. Lett. , vol.100 , pp. 253505
- Tang, J.¹ Li, S.² Zhao, W.³ Wang, Y.⁴ Duan, Y.⁵

7
- 84899927019
- 10.1088/0022-3727/21/5/028
- S. Kanazawa, M. Kogoma, T. Moriwaki, and S. Okazaki, J. Phys. D: Appl. Phys. 21, 838 (1988). 10.1088/0022-3727/21/5/028
- (1988) J. Phys. D: Appl. Phys. , vol.21 , pp. 838
- Kanazawa, S.¹ Kogoma, M.² Moriwaki, T.³ Okazaki, S.⁴

8
- 0034247479
- 10.1088/0963-0252/9/3/312
- N. Gherardi, G. Gouda, E. Gat, A. Ricard, and F. Massines, Plasma Sources Sci. Technol. 9, 340 (2000). 10.1088/0963-0252/9/3/312
- (2000) Plasma Sources Sci. Technol. , vol.9 , pp. 340
- Gherardi, N.¹ Gouda, G.² Gat, E.³ Ricard, A.⁴ Massines, F.⁵

9
- 33746433559
- 10.1088/1009-0630/6/6/012
- Z. Fang, Y. Qiu, and H. Wang, Plasma Sci. Technol. 6, 2576 (2004). 10.1088/1009-0630/6/6/012
- (2004) Plasma Sci. Technol. , vol.6 , pp. 2576
- Fang, Z.¹ Qiu, Y.² Wang, H.³

10
- 14544290686
- 10.1088/0022-3727/38/4/003
- K. Kozlov, R. Brandenburg, H. Wagner, A. M. Morozov, and P. Michel, J. Phys. D: Appl. Phys. 38, 518 (2005). 10.1088/0022-3727/38/4/003
- (2005) J. Phys. D: Appl. Phys. , vol.38 , pp. 518
- Kozlov, K.¹ Brandenburg, R.² Wagner, H.³ Morozov, A.M.⁴ Michel, P.⁵

11
- 33745450143
- 10.1103/PhysRevLett.96.255001
- L. Stollenwerk, S. Amiranashvili, J.-P. Boeuf, and H. Purwins, Phys. Rev. Lett. 96, 255001 (2006). 10.1103/PhysRevLett.96.255001
- (2006) Phys. Rev. Lett. , vol.96 , pp. 255001
- Stollenwerk, L.¹ Amiranashvili, S.² Boeuf, J.-P.³ Purwins, H.⁴

12
- 84859550645
- 10.1063/1.3698135
- Q. Li, H. Takana, Y. Pu, and H. Nishiyama, Appl. Phys. Lett. 100, 133501 (2012). 10.1063/1.3698135
- (2012) Appl. Phys. Lett. , vol.100 , pp. 133501
- Li, Q.¹ Takana, H.² Pu, Y.³ Nishiyama, H.⁴

13
- 4644316900
- 10.1016/S0257-8972(03)00540-1
- F. Massines, P. Ségur, N. Gherardi, C. Khamphan, and A. Ricard, Surf. Coat. Technol. 174, 8 (2003). 10.1016/S0257-8972(03)00540-1
- (2003) Surf. Coat. Technol. , vol.174 , pp. 8
- Massines, F.¹ Ségur, P.² Gherardi, N.³ Khamphan, C.⁴ Ricard, A.⁵

14
- 79955986419
- 10.1063/1.1458684
- L. Mangolini, K. Orlov, U. Kortshagen, J. Heberlein, and U. Kogelschatz, Appl. Phys. Lett. 80, 1722 (2002). 10.1063/1.1458684
- (2002) Appl. Phys. Lett. , vol.80 , pp. 1722
- Mangolini, L.¹ Orlov, K.² Kortshagen, U.³ Heberlein, J.⁴ Kogelschatz, U.⁵

15
- 0037422652
- 10.1088/0022-3727/36/1/306
- Yu. B. Golubovskii, V. A. Maiorov, J. Behnke, and J. F. Behnke, J. Phys. D: Appl. Phys. 36, 39 (2003). 10.1088/0022-3727/36/1/306
- (2003) J. Phys. D: Appl. Phys. , vol.36 , pp. 39
- Golubovskii, Yu.B.¹ Maiorov, V.A.² Behnke, J.³ Behnke, J.F.⁴

16
- 8744312491
- 10.1088/0256-307X/21/11/044
- Y. H. Wang and D. Z. Wang, Chin. Phys. Lett. 21, 2234 (2004). 10.1088/0256-307X/21/11/044
- (2004) Chin. Phys. Lett. , vol.21 , pp. 2234
- Wang, Y.H.¹ Wang, D.Z.²

17
- 18844386521
- 10.1109/TPS.2005.844493
- D. Lee, J. M. Park, S. H. Hong, and Y. Kim, IEEE Trans. Plasma Sci. 33, 949 (2005). 10.1109/TPS.2005.844493
- (2005) IEEE Trans. Plasma Sci. , vol.33 , pp. 949
- Lee, D.¹ Park, J.M.² Hong, S.H.³ Kim, Y.⁴

18
- 29144507740
- 10.1088/0022-3727/39/1/023
- P. Zhang and U. Kortshagen, J. Phys. D: Appl. Phys. 39, 153 (2006). 10.1088/0022-3727/39/1/023
- (2006) J. Phys. D: Appl. Phys. , vol.39 , pp. 153
- Zhang, P.¹ Kortshagen, U.²

19
- 36549041386
- 10.1063/1.2819073
- H. Luo, Z. Liang, B. Lv, X. Wang, Z. Guan, and L. Wang, Appl. Phys. Lett. 91, 221504 (2007). 10.1063/1.2819073
- (2007) Appl. Phys. Lett. , vol.91 , pp. 221504
- Luo, H.¹ Liang, Z.² Lv, B.³ Wang, X.⁴ Guan, Z.⁵ Wang, L.⁶

20
- 77952498530
- Y. Hao, L. Yang, E. Tu, J. Chen, Z. Zhu, and X. Wang, Acta Phys. Sin. 59, 2610 (2010).
- (2010) Acta Phys. Sin. , vol.59 , pp. 2610
- Hao, Y.¹ Yang, L.² Tu, E.³ Chen, J.⁴ Zhu, Z.⁵ Wang, X.⁶

21
- 80655142537
- 10.1063/1.3647551
- Q. Wang, J. Z. Sun, and D. Z. Wang, Phys. Plasmas 18, 103504 (2011). 10.1063/1.3647551
- (2011) Phys. Plasmas , vol.18 , pp. 103504
- Wang, Q.¹ Sun, J.Z.² Wang, D.Z.³

22
- 84860449079
- 10.1063/1.3700176
- D. Z. Zhang, Y. H. Wang, J. Z. Sun, and D. Z. Wang, Phys. Plasmas 19, 043503 (2012). 10.1063/1.3700176
- (2012) Phys. Plasmas , vol.19 , pp. 043503
- Zhang, D.Z.¹ Wang, Y.H.² Sun, J.Z.³ Wang, D.Z.⁴

23
- 84864229918
- 10.1088/1674-1056/21/7/075204
- X. Li, D. Niu, L. Xu, P. Jia, and Y. Chang, Chin. Phys. B 21, 075204 (2012). 10.1088/1674-1056/21/7/075204
- (2012) Chin. Phys. B , vol.21 , pp. 075204
- Li, X.¹ Niu, D.² Xu, L.³ Jia, P.⁴ Chang, Y.⁵

24
- 84872981664
- 10.1063/1.4788721
- J. Tang, W. Jiang, W. Zhao, Y. Wang, S. Li, H. Wang, and Y. Duan, Appl. Phys. Lett. 102, 033503 (2013). 10.1063/1.4788721
- (2013) Appl. Phys. Lett. , vol.102 , pp. 033503
- Tang, J.¹ Jiang, W.² Zhao, W.³ Wang, Y.⁴ Li, S.⁵ Wang, H.⁶ Duan, Y.⁷

25
- 84866989237
- 10.1063/1.4752419
- I. Rafatov, E. A. Bogdanov, and A. A. Kudryavtsev, Phys. Plasmas 19, 093503 (2012). 10.1063/1.4752419
- (2012) Phys. Plasmas , vol.19 , pp. 093503
- Rafatov, I.¹ Bogdanov, E.A.² Kudryavtsev, A.A.³

26
- 27744564154
- 10.1088/0963-0252/14/4/011
- G. J. M. Hagelaar and L. C. Pitchford, Plasma Sources Sci. Technol. 14, 722 (2005). 10.1088/0963-0252/14/4/011
- (2005) Plasma Sources Sci. Technol. , vol.14 , pp. 722
- Hagelaar, G.J.M.¹ Pitchford, L.C.²

27
- 42549112163
- 10.1088/0022-3727/41/5/055204
- N. A. Dyatk, Y. Z. Ionikh, I. V. Kochetov, D. L. Marinov, A. V. Meshchanov, A. P. Napartovich, F. B. Petrov, and S. A. Starostin, J. Phys. D: Appl. Phys. 41, 055204 (2008). 10.1088/0022-3727/41/5/055204
- (2008) J. Phys. D: Appl. Phys. , vol.41 , pp. 055204
- Dyatk, N.A.¹ Ionikh, Y.Z.² Kochetov, I.V.³ Marinov, D.L.⁴ Meshchanov, A.V.⁵ Napartovich, A.P.⁶ Petrov, F.B.⁷ Starostin, S.A.⁸

28
- 0000044491
- 10.1063/1.98183
- A. D. Richards, B. E. Thompson, and H. H. Sawin, Appl. Phys. Lett. 50, 492 (1987). 10.1063/1.98183
- (1987) Appl. Phys. Lett. , vol.50 , pp. 492
- Richards, A.D.¹ Thompson, B.E.² Sawin, H.H.³

29
- 58149252652
- 10.1063/1.3033754
- H. Shi, Y. H. Wang, and D. Z. Wang, Phys. Plasmas 15, 122306 (2008). 10.1063/1.3033754
- (2008) Phys. Plasmas , vol.15 , pp. 122306
- Shi, H.¹ Wang, Y.H.² Wang, D.Z.³

30
- 0032022902
- 10.1063/1.367051
- F. Massines, A. Rabehi, P. Decomps, R. B. Gadri, P. Ségur, and C. Mayoux, J. Appl. Phys. 83, 2950 (1998). 10.1063/1.367051
- (1998) J. Appl. Phys. , vol.83 , pp. 2950
- Massines, F.¹ Rabehi, A.² Decomps, P.³ Gadri, R.B.⁴ Ségur, P.⁵ Mayoux, C.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.