-
5
-
-
84855265098
-
-
A. Vidal Chemosphere 36 1998 2606 2653
-
(1998)
Chemosphere
, vol.36
, pp. 2606-2653
-
-
Vidal, A.1
-
9
-
-
59349100302
-
-
K. Rajeshwar, M.E. Osugi, W. Chanmanee, C.R. Chenthamarakshan, M.V.B. Zanoni, P. Kajitvichyanukul, and R. Krishnan-Ayer J. Photochem. Photobiol. C: Photochem. Rev. 9 2008 171 192
-
(2008)
J. Photochem. Photobiol. C: Photochem. Rev.
, vol.9
, pp. 171-192
-
-
Rajeshwar, K.1
Osugi, M.E.2
Chanmanee, W.3
Chenthamarakshan, C.R.4
Zanoni, M.V.B.5
Kajitvichyanukul, P.6
Krishnan-Ayer, R.7
-
10
-
-
76149100896
-
-
X.L. Lu, X.L. Mou, J.J. Wu, D.W. Zhang, L.L. Zhang, F.Q. Huang, F.F. Xu, and S.M. Huang Adv. Funct. Mater. 3 2010 509 515
-
(2010)
Adv. Funct. Mater.
, vol.3
, pp. 509-515
-
-
Lu, X.L.1
Mou, X.L.2
Wu, J.J.3
Zhang, D.W.4
Zhang, L.L.5
Huang, F.Q.6
Xu, F.F.7
Huang, S.M.8
-
12
-
-
79954570080
-
-
W. Guo, Y.H. Shen, G. Boschloo, A. Hagfeldt, and T.L. Ma Electrochim. Acta 12 2011 4611 4617
-
(2011)
Electrochim. Acta
, vol.12
, pp. 4611-4617
-
-
Guo, W.1
Shen, Y.H.2
Boschloo, G.3
Hagfeldt, A.4
Ma, T.L.5
-
13
-
-
84863012219
-
-
Y. Cui, H.Y. Chen, M. Zheng, Z.F. Dai, and S.Q. Liu J. Nanosci. Nanotechnol. 5 2011 3851 3860
-
(2011)
J. Nanosci. Nanotechnol.
, vol.5
, pp. 3851-3860
-
-
Cui, Y.1
Chen, H.Y.2
Zheng, M.3
Dai, Z.F.4
Liu, S.Q.5
-
14
-
-
79952590460
-
-
T.K. Sung, J.H. Kang, D.M. Jang, Y. Myung, G.B. Jung, H.S. Kim, C.S. Jung, Y.J. Cho, J. Park, and C.L. Lee J. Mater. Chem. 12 2011 4553 4561
-
(2011)
J. Mater. Chem.
, vol.12
, pp. 4553-4561
-
-
Sung, T.K.1
Kang, J.H.2
Jang, D.M.3
Myung, Y.4
Jung, G.B.5
Kim, H.S.6
Jung, C.S.7
Cho, Y.J.8
Park, J.9
Lee, C.L.10
-
15
-
-
79952405284
-
-
N. Chouhan, C.L. Yeh, S.F. Hu, R.S. Liu, W.S. Chang, and K.H. Chen Chem. Commun. 12 2011 3493 3495
-
(2011)
Chem. Commun.
, vol.12
, pp. 3493-3495
-
-
Chouhan, N.1
Yeh, C.L.2
Hu, S.F.3
Liu, R.S.4
Chang, W.S.5
Chen, K.H.6
-
18
-
-
77956696048
-
-
C.W. Zou, Y.F. Rao, A. Alyamani, W. Chu, M.J. Chen, D.A. Patterson, E.A.C. Emanuelsson, and W. Gao Langmuir 26 2010 11615 11620
-
(2010)
Langmuir
, vol.26
, pp. 11615-11620
-
-
Zou, C.W.1
Rao, Y.F.2
Alyamani, A.3
Chu, W.4
Chen, M.J.5
Patterson, D.A.6
Emanuelsson, E.A.C.7
Gao, W.8
-
19
-
-
78751549134
-
-
Z.J. Ning, H.N. Tian, C.Z. Yuan, Y. Fu, H.Y. Qin, L.C. Sun, and H. Agren Chem. Commun. 47 2011 1536 1538
-
(2011)
Chem. Commun.
, vol.47
, pp. 1536-1538
-
-
Ning, Z.J.1
Tian, H.N.2
Yuan, C.Z.3
Fu, Y.4
Qin, H.Y.5
Sun, L.C.6
Agren, H.7
-
21
-
-
78049424820
-
-
Y.S. Li, F.L. Jiang, Q. Xiao, R. Li, K. Li, M.F. Zhang, A.Q. Zhang, S.F. Sun, and Y. Liu Appl. Catal. B: Environ. 101 2010 118 129
-
(2010)
Appl. Catal. B: Environ.
, vol.101
, pp. 118-129
-
-
Li, Y.S.1
Jiang, F.L.2
Xiao, Q.3
Li, R.4
Li, K.5
Zhang, M.F.6
Zhang, A.Q.7
Sun, S.F.8
Liu, Y.9
-
22
-
-
84870680667
-
-
H. Feng, T.T. Tran, L. Chen, L.J. Yuan, and Q.Y. Cai Chem. Eng. J. 215-216 2013 591 599
-
(2013)
Chem. Eng. J.
, vol.215-216
, pp. 591-599
-
-
Feng, H.1
Tran, T.T.2
Chen, L.3
Yuan, L.J.4
Cai, Q.Y.5
-
28
-
-
0035813774
-
-
A. Gedanken, Y. Wang, X. Tang, N. Perkas, Y. Koltypin, M.V. Landau, L. Vradman, and M. Herskowitz Chem. Eur. J. 7 2001 4546 4552
-
(2001)
Chem. Eur. J.
, vol.7
, pp. 4546-4552
-
-
Gedanken, A.1
Wang, Y.2
Tang, X.3
Perkas, N.4
Koltypin, Y.5
Landau, M.V.6
Vradman, L.7
Herskowitz, M.8
-
29
-
-
34249680775
-
-
S.S. Lee, K.W. Seo, S.H. Yoon, I.W. Shim, K.T. Byun, and H.Y. Kwak Bull. Kor. Chem. Soc. 26 2005 1579 1581
-
(2005)
Bull. Kor. Chem. Soc.
, vol.26
, pp. 1579-1581
-
-
Lee, S.S.1
Seo, K.W.2
Yoon, S.H.3
Shim, I.W.4
Byun, K.T.5
Kwak, H.Y.6
-
31
-
-
41949128413
-
-
S.S. Lee, K.T. Byun, J.P. Park, S.K. Kim, J.C. Lee, S.K. Chang, H.Y. Kwak, and I.W. Shima Chem. Eng. J. 139 2008 194 197
-
(2008)
Chem. Eng. J.
, vol.139
, pp. 194-197
-
-
Lee, S.S.1
Byun, K.T.2
Park, J.P.3
Kim, S.K.4
Lee, J.C.5
Chang, S.K.6
Kwak, H.Y.7
Shima, I.W.8
-
33
-
-
71749116089
-
-
J.P. Park, S.K. Kim, J.Y. Park, S. Ahn, K.M. Ok, H.Y. Kwak, and I.W. Shima Thin Solid Films 517 2009 6663 6665
-
(2009)
Thin Solid Films
, vol.517
, pp. 6663-6665
-
-
Park, J.P.1
Kim, S.K.2
Park, J.Y.3
Ahn, S.4
Ok, K.M.5
Kwak, H.Y.6
Shima, I.W.7
|